x-ray magnifying imaging system

Abstract

The invention discloses an X-ray magnifying imaging system. The X-ray magnifying imaging system comprises: an X-ray light source; an X-ray light source lens, an X-ray light source is arranged at the entrance end of which is used for condensing the X-rays emitted by the X-ray light source and obtaining the X-ray light source. The coherent light source of the micro-focal spot irradiating the sample; the phase magnifying grating, which is arranged behind the sample, is used to collect and modulate the X-rays after irradiating the sample and produce the diffraction self-imaging effect; the analytical absorption magnifying grating is arranged behind the phase magnifying grating and is located in At the position of the self-imaging plane corresponding to the diffraction self-imaging effect, the analytical absorption amplifying grating is used to collect and process the X-rays from the phase amplifying grating, and convert the phase information into identifiable light intensity information; the X-ray detector is set at After analyzing the absorption amplifying grating, it is close to the outlet end of the analyzing absorption amplifying grating for detecting and collecting the information of the sample. The invention can greatly improve the resolution and application range of the X-ray magnified imaging system.

Description

technical field [0001] The invention relates to the technical field of optical imaging, in particular to an X-ray magnified imaging system. Background technique [0002] At present, X-ray gratings have important applications in the fields of life, energy, environment, food, etc. Since X-ray gratings are very precise optical devices, they have high requirements for manufacturing technology, especially the production of high-quality two-dimensional X-ray gratings Therefore, how to make high-quality two-dimensional X-ray gratings has attracted the attention of relevant researchers. Existing methods for fabricating gratings mainly use mechanical scribing, holographic lithography, electron beam lithography, X-ray lithography and micro-plating techniques, etc., but the "aspect ratio" of the X-ray gratings produced by these methods is not Large, and these methods have difficulties in fabricating two-dimensional high-energy X-ray gratings with a large "aspect ratio", mainly because...

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