Moringa seed essence anti-pollution facial mask and preparation process thereof

An anti-pollution, moringa seed technology, applied in cosmetic preparations, cosmetic preparations, preparations for skin care, etc., can solve the problem of not being able to supply skin nutrition and moisture well, single function, unable to repair damaged skin, etc. problems, to achieve the effect of improving skin dehydration, repairing damaged skin, and excellent purifying power

Inactive Publication Date: 2017-08-29
广州诺胜化妆品有限公司
View PDF5 Cites 5 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] There are many types of facial masks on the market, but their functions are relatively single, they cannot provide skin nutrition and moisture well, and cannot re...

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0014] An anti-pollution facial mask of Moringa seed extract, which comprises: butanediol, 1,3-propanediol, Hamamelis hamamelis extract, xanthan gum, sodium hyaluronate, yeast extract, Leuconostoc radish root fermentation Product filtrate, wing seed Moringa seed extract, 1,2-hexanediol, water, the composition percentage of described Moringa seed essence anti-pollution mask is: butanediol 4.0-6.0%, 1,3-propanediol 2.0- 3.0%, Witch Hazel Extract 3.0-5.0%, Xanthan Gum 0.05-0.10%, Sodium Hyaluronate 0.05-0.10%, Yeast Extract 1.0-2.0%, Leuconostoc / Radish Root Ferment Filtrate 2.0- 2.5%, Moringa oleifera seed extract 0.5-2.0%, 1,2-hexanediol 0.4-1.0%, water added to 100%.

Embodiment 2

[0016] According to the Moringa seed essence anti-pollution mask described in Example 1, the composition percentage of the Moringa seed essence anti-pollution mask is: 4.0% butanediol, 2.0% 1,3-propanediol, 3.0% North American witch hazel extract %, Xanthan Gum 0.05%, Sodium Hyaluronate 0.05%, Yeast Extract 1.0%, Leuconostococcus / Radish Root Ferment Filtrate 2.0%, Moringa Moringa Seed Extract 0.5%, 1,2-Hexanediol 0.4%, add water to 100%.

Embodiment 3

[0018] According to the anti-pollution mask of Moringa seed essence described in embodiment 1 or 2, the composition percentage of described Moringa seed essence anti-pollution mask is: butanediol 6.0%, 1,3-propanediol 3.0%, North American witch hazel extract 5.0% xanthan gum, 0.10% xanthan gum, 0.10% sodium hyaluronate, 2.0% yeast extract, 2.5% leuconostoc / radish root fermentation product filtrate, 2.0% moringa seed extract, 1,2-hexyl Glycol 1.0%, water added to 100%.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a moringa seed essence anti-pollution facial mask which comprises the following compositions in percentage by weight: 4.0-6.0 percent of butanediol, 2.0-3.0 percent of 1,3-propylene glycol, 3.0-5.0 percent of hamamelis virginiana extract, 0.05-0.10 percent of xanthan gum, 0.05-0.10 percent of sodium hyaluronate, 1.0-2.0 percent of yeast extract, 2.0-2.5 percent of leuconostoc/radish root fermentation product filtrate, 0.5-2.0 percent of moringa pterygosperma seed extract, 0.4-1.0 percent of 1,2-hexanediol and the balance of water. A moringa seed essence in the facial mask has an excellent purifying ability, provides invisible protection for skin and can purify the skin, activate the skin, fuse the yeast extract, the sodium hyaluronate and other components, effectively supplement skin nutrition and moisture, repair the damaged skin, solve the problems of skin water shortage, darkness, gloominess and the like and bring along the transparent, watery and smooth skin.

Description

technical field [0001] The invention relates to the technical field of anti-pollution mask of Moringa seed essence and its preparation process, in particular to an anti-pollution mask of Moringa seed essence and its preparation process. Background technique [0002] At present, with the improvement of people's living standards, people's demand for cosmetics is also increasing. Being able to make full use of Moringa and combine its ingredients with cosmetics can have a very good cosmetic effect and achieve the purpose of anti-wrinkle and anti-wrinkle; [0003] There are many types of facial masks on the market, but their functions are relatively single, they cannot provide skin nutrition and moisture well, and cannot repair damaged skin well. Therefore, a kind of anti-pollution facial mask with Moringa seed essence and its preparation process are proposed to facilitate People use and produce. Contents of the invention [0004] The object of the present invention is to pro...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): A61K8/99A61K8/34A61K8/9789A61K8/9728A61K8/73A61Q19/00
CPCA61K8/99A61K8/345A61K8/73A61K8/735A61K8/97A61Q19/00
Inventor 赵凌
Owner 广州诺胜化妆品有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap