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No-clean moisturizing facial mask as well as preparation method and application thereof

A wet surface and raw material technology, applied in the field of skin care products, can solve the problems of short water lock time and poor skin feel, and achieve the effect of uniform texture, delicate and smooth skin feel, and small particle size.

Active Publication Date: 2018-08-21
青岛黛优佳生物科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] One of the purposes of the present invention is to solve the technical problems such as poor skin feeling and short water locking time in the above-mentioned no-wash moisturizing mask and a kind of no-wash moisturizing mask

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0051] A wash-free moisturizing mask, calculated in parts by weight, the composition and content of the raw materials used for its preparation are as follows:

[0052] Glycerin 10.00 parts

[0053] Propylene glycol 1.00 parts

[0054] Butanediol 2.00 parts

[0055] Hyaluronic acid 0.02 parts

[0056] 16-18 alcohol 7.00 parts

[0057] Cetearyl alcohol 2.00 parts

[0058] Caprylic triglyceride 0.10 parts

[0059] Polydimethylsiloxane 0.20 parts

[0060] Palmitic acid 0.20 parts

[0061] Polysorbate-20 0.10 parts

[0062] xanthan gum 0.07 parts

[0063] 0.01 parts of EDTA

[0064] Vitamin E 1.00 parts

[0065] Fe 3 o 4 Magnetic nano powder 3.00 parts

[0066] 73.31 parts of deionized water;

[0067] The above Fe 3 o 4 The particle size of the magnetic nanopowder is 20-50nm, which is prepared by the following steps:

[0068] Fe 3 o 4 The raw materials used in the preparation of magnetic nano powder are calculated in parts by weight, and the composition and conte...

Embodiment 2

[0084] A wash-free moisturizing mask, calculated in parts by weight, the composition and content of the raw materials used for its preparation are as follows:

[0085] Glycerin 12.00 parts

[0086] Propylene glycol 2.00 parts

[0087] Butanediol 3.00 parts

[0088] Hyaluronic acid 0.01 parts

[0089] 16-18 alcohol 8.00 parts

[0090] Cetearyl alcohol 3.00 parts

[0091] Caprylic triglyceride 0.20 parts

[0092] Polydimethylsiloxane 0.30 parts

[0093] Palmitic acid 0.30 parts

[0094] Polysorbate-20 0.20 parts

[0095] xanthan gum 0.08 part

[0096] 0.02 parts of EDTA

[0097] Vitamin E 2.00 parts

[0098] Fe 3 o 4 Magnetic nano powder 4.00 parts

[0099] 64.89 parts of deionized water;

[0100] The Fe 3 o 4 The particle size of the magnetic nanopowder is 20-50nm, which is prepared by the following steps:

[0101] Fe 3 o 4 The raw materials used in the preparation of magnetic nano powder are calculated in parts by weight, and the composition and content of t...

Embodiment 3

[0117] A wash-free moisturizing mask, calculated in parts by weight, the composition and content of the raw materials used for its preparation are as follows:

[0118] Glycerin 15.00 parts

[0119] Propylene glycol 3.00 parts

[0120] Butanediol 4.00 parts

[0121] Hyaluronic acid 0.03 parts

[0122] 16-18 alcohol 9.00 parts

[0123] Cetearyl alcohol 4.00 parts

[0124] Caprylic triglyceride 0.30 parts

[0125] Polydimethylsiloxane 0.40 parts

[0126] Palmitic acid 0.40 parts

[0127] Polysorbate-20 0.30 parts

[0128] xanthan gum 0.09 parts

[0129] 0.02 parts of EDTA

[0130] Vitamin E 3.00 parts

[0131] Fe 3 o 4 Magnetic nano powder 6.00 parts

[0132] 52.45 parts of deionized water;

[0133] The Fe 3 o 4 The particle size of the magnetic nanopowder is 20-50nm, which is prepared by the following steps:

[0134] Fe 3 o 4 The raw materials used in the preparation of magnetic nano powder are calculated in parts by weight, and the composition and content of ...

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Abstract

The invention discloses a no-clean moisturizing facial mask as well as a preparation method and application thereof. The no-clean moisturizing facial mask is prepared from the following raw materialsin part by weight: 52.45-73.31 parts of deionized water, 10.00-15.00 parts of glycerinum, 1.00-3.00 parts of propylene glycol, 2.00-4.00 parts of butanediol, 0.01-0.03 parts of hyaluronic acid, 7.00-9.00 parts of 16-18 alcohol, 2.00-4.00 parts of cetostearyl alcohol, 0.10-0.30 part of caprylic triglyceride, 0.20-0.40 part of polydimethylsiloxane, 0.20-0.40 part of palmitic acid, 0.10-0.30 part ofpolysorbate-20, 0.07-0.09 part of xanthan gum and 3.00-6.00 parts of Fe3O4 magnetic nano powder with a particle size of 20-50 nm. The no-clean moisturizing facial mask can deeply clean and nourish skin and is not required to be cleaned, and the water lock time is up to 8 h.

Description

technical field [0001] The invention relates to a wash-free moisturizing facial mask and its preparation method and application, belonging to the field of skin care products. Background technique [0002] With the development of the beauty field, facial masks have been favored by more and more consumers because of their outstanding moisturizing effect and good absorption effect. Moisturizing mask has gradually become a kind of skin care product commonly used by everyone. Among them, the most popular stick-type mask uses its short time covering the face to isolate the outside air and pollution, increase the temperature of the skin, expand the pores of the skin, promote the secretion and metabolism of sweat glands, and increase the oxygen content of the skin. It is beneficial to the metabolism products of epidermal cells and accumulated oily substances. The moisture and nutrients in the mask penetrate into the stratum corneum of the epidermis, making the skin soft and natural...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): A61K8/19A61Q19/00A61Q19/10
CPCA61K8/19A61K2800/413A61Q19/00A61Q19/10
Inventor 胡静高子豪刘珊珊程述邓维钧
Owner 青岛黛优佳生物科技有限公司
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