Attendance management method and system

A attendance management and attendance technology, applied in the management field, can solve problems such as tampering or deletion of attendance records, opaque storage process, etc., and achieve the effect of improving the efficiency of attendance management

Pending Publication Date: 2020-10-16
BANK OF CHINA
View PDF3 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] However, during the attendance process, attendance records are generated by devices that identify users, and the attendance records are stored in a centralized data center. The storage process is opaque and is the responsibility of the administrator, resulting in the possibility of tampering or deletion of attendance records.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Attendance management method and system
  • Attendance management method and system
  • Attendance management method and system

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0044] The following will clearly and completely describe the technical solutions in the embodiments of the application with reference to the drawings in the embodiments of the application. Apparently, the described embodiments are only some of the embodiments of the application, not all of them. Based on the embodiments in this application, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the scope of protection of this application.

[0045] This application discloses a method for attendance management, the flow chart of which is as follows figure 1 shown, including:

[0046] Step S11, obtaining attendance check-in information;

[0047] Step S12, generating attendance data based on the attendance sign-in information, and storing the attendance data;

[0048] Step S13, if the first condition is satisfied, the attendance data is stored in the blockchain.

[0049] The current attendance system generally uses IC c...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses an attendance management method and system, and the method comprises the steps: obtaining attendance check-in information, generating attendance check-in data based on the attendance check-in information, storing the attendance check-in data, and storing the attendance check-in data to a blockchain if a first condition is met. According to the scheme, the attendance data isstored in the block chain, an administrator does not need to take charge, so that the attendance data stored in the block chain is public and transparent, tamper resistance of the attendance data isguaranteed, meanwhile, the attendance situation can be tracked in time, and the attendance management efficiency is effectively improved.

Description

technical field [0001] This application relates to the field of management, in particular to an attendance management method and system. Background technique [0002] The current attendance system generally uses IC cards, certificates, fingerprints, face recognition and other technologies to identify users who are using the system, and then the administrator or the device that identifies the user directly creates an attendance record that includes the user's identity, current time, and current location. Then store it in the specified physical medium online or offline. [0003] However, during the attendance process, attendance records are generated by devices that identify users and are stored in a centralized data center. The storage process is opaque and is the responsibility of the administrator, resulting in the possibility of tampering or deletion of attendance records. Contents of the invention [0004] In view of this, the application provides a method and system f...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): G06Q10/10G06F16/27G06F21/64G07C1/10
CPCG06Q10/105G06F16/27G06F21/64G07C1/10
Inventor 方莲娣方梦佳
Owner BANK OF CHINA
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap