Etching solution for laser cutting lens made of DT-STAR material and using method thereof

Abstract

The invention discloses an etching solution for DT-STAR material laser cutting lens and a using method thereof. The etching solution is prepared from, by weight, 30-35 parts of a sulfuric acid solution, 10-12 parts of a hydrofluoric acid solution and 55-60 parts of water. The quality temperature of a chemically strengthened glass product prepared through the etching solution is high, the surface of the chemically strengthened glass is free of large-area pocking marks and scratches, the reject ratio is 0%, the preparation is simple, and polishing treatment is not needed.

Description

technical field [0001] The invention belongs to the technical field of glass etching, in particular to DT-STAR material laser cutting lens etchant and its application method. Background technique [0002] After the lens glass for mobile phone is cut and edged by laser, there will be many microcracks on the edge of the lens glass, resulting in a very low bending strength of the glass, generally lower than 200MP. In order to enhance the strength of the lens glass, hydrofluoric acid is often used to etch the edge surface of the glass to remove micro-cracks, and improve the strength and impact resistance of the glass; at the same time, it is etched and thinned by hydrofluoric acid etching solution. [0003] At present, the material thickness of DT-STAR glass is 0.55MM, and the etching thinning amount is 50um. In the etching solution used in the traditional etching process of laser cutting lenses, sulfuric acid 30%, hydrofluoric acid 10%, hydrochloric acid 20%, or add Active age...

AI Technical Summary

Problems solved by technology

[0003] At present, the material thickness of DT-STAR glass is 0.55MM, and the etching thinning amount is 50um. In the etching solution used in the traditional etching process of laser cutting lenses, sulfuric acid 30%, hydrofluoric acid 10%, hydrochloric acid 20%, or add Active agent 0.01%, water 40%, with the current etching solution, combined with the existing spot etching process, after etching, the glass surface presents large areas of pitting and irregular scratches, and the defect rate is 100%. In order to meet the shipment, 100% polishing is required, which seriously restricts production capacity and delivery capacity, and the stability of product quality cannot be guaranteed, which leads to relatively complicated etching process, long production cycle, low yield and other problems, which need further improvement