Controllable pulse ion beam modification method based on frequency domain parameter adjustment

A technology of pulsed ion beam and frequency domain parameters, which is applied in the direction of discharge tubes, electrical components, circuits, etc., can solve the problems of ion source fluctuations, increase the number of modification iterations, and short dwell time, and achieve shortened iterations and high convergence than the effect

Pending Publication Date: 2022-07-08
NAT UNIV OF DEFENSE TECH
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  • Abstract
  • Description
  • Claims
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Problems solved by technology

[0004] The existing ion beam modification is to control the length of processing residence time in different areas of the workpiece surface, so as to realize the specific material removal amount of the ion beam in a specific area, but is limited by the motion performance of the machine tool and the surface shape error of the actual workpiece surface. In the case of less material to be removed, the dwell time of this region will become extremely short, or even zero, which is difficult to achieve in actual processing, so the traditional continuous ion beam inevitably has additional removal layer, increasing the number of iterations for shaping
[0005] At the same time, the key parameter that determines the resolution of existing ion beam modification is the movement speed of the machine tool. The faster the speed, the less the removal amount. If the removal amount required by the surface shape error is extremely small, there is an upper limit only by increasing the movement speed of the machine tool, and Excessive motion speed can cause fluctuations in the ion source, thereby affecting the stability of the removal function

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  • Controllable pulse ion beam modification method based on frequency domain parameter adjustment
  • Controllable pulse ion beam modification method based on frequency domain parameter adjustment
  • Controllable pulse ion beam modification method based on frequency domain parameter adjustment

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Embodiment 2

[0098] This embodiment is a modification of the first embodiment. The next duty cycle matrix DC in step 3.2) of this embodiment k+1 The relaxation factor ξ is removed from the calculation function expression of . Compared with the first embodiment, after the relaxation factor ξ is deleted in this embodiment, the convergence stability will be reduced to some extent. In this embodiment, the next duty cycle matrix DC in step 3.2) k+1 The calculation function expression of is:

[0099] DC k+1 =DC k +Δ k ,

[0100] In the above formula, DC k is the current duty cycle matrix, Δ k is the current duty cycle matrix correction amount, and has:

[0101] Δ k =E k / B,

[0102] In the above formula, E k is the current surface shape residual, and B is the strength of the removal function.

[0103] In addition, the present embodiment also provides a controllable pulsed ion beam shaping system based on frequency-domain parameter adjustment, comprising a microprocessor and a memor...

Embodiment 3

[0106] This embodiment is a further improvement to the first embodiment. Considering that one round of processing in step 4) of the first embodiment may not necessarily make the surface shape of the modified surface of the component meet the requirements, this embodiment is based on the first embodiment to iterate based on the preset surface shape requirements. processing method. Specifically, after step 4) in this embodiment, it also includes detecting the shape of the modified surface of the processed component to determine whether the shape after processing meets the requirements, and if it does not meet the requirements, jump to step 4) to continue the iteration Processing; otherwise, end and exit. Through the above-mentioned surface shape detection and iterative judgment, iterative processing based on preset surface shape requirements can be realized, thereby effectively improving the efficiency of surface shape iterative processing.

[0107] In this embodiment, ZYG0 whi...

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Abstract

The invention discloses a controllable pulse ion beam modification method based on frequency domain parameter adjustment. The method comprises the steps that the machining amount of the modified surface of the element is obtained; gridding the modified surface of the element, calculating an initial duty ratio matrix and a surface shape residual error of each grid of the modified surface according to the processing amount, and iteratively optimizing the duty ratio matrix; and according to the obtained duty ratio matrix after iteration optimization, controlling the duty ratio of the pulse ion beam to carry out shaping on the shaped surface of the element. According to the method, a traditional mode of keeping the ion beam removal function stable and unchanged in the machining process is changed, the removal efficiency of the removal function is dynamically regulated and controlled, the duty ratio is set to be zero in an area where materials do not need to be removed, an extra removal layer caused by adjustment based on residence time is avoided, the convergence ratio of shaping is increased, and the processing efficiency of the ion beam removal function is improved. The polishing efficiency is improved while the advantages of traditional ion beam polishing are reserved, and the highest resolution of ion beam shaping is improved by controlling single pulse removal.

Description

technical field [0001] The invention relates to an ion beam ultra-precision machining technology, in particular to a controllable pulsed ion beam modification method based on frequency domain parameter adjustment. Background technique [0002] High-precision optical devices are the basic guarantee for the performance of optical systems. With the rapid development of modern technology, the demand for high-precision optical components is increasing, especially in the fields of laser nuclear fusion, lithography machine manufacturing, national defense equipment and other fields, the precision requirements of optical components have reached the manufacturing limit, and components have high precision, high convergence ratio, low The manufacture of damage has become the challenge of the times. [0003] Ion beam polishing, as a non-contact polishing tool, removes material through sputtering by beam bombarding the surface of the element. The ion beam polishing removal function appr...

Claims

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Application Information

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Patent Type & AuthorityApplications(China)
IPC IPC(8): H01J37/244H01J37/30H01J37/302
CPCH01J37/3026H01J37/30H01J37/244H01J37/302H01J37/3056
Inventor田野石峰谢凌波周光奇宋辞铁贵鹏周港沈永祥
OwnerNAT UNIV OF DEFENSE TECH