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Transmission type liquid crystal display device and method for fabricating the same

A liquid crystal display, transmissive technology, used in instruments, nonlinear optics, optics, etc., to achieve good display, reduce influence, and improve the effect of aperture ratio

Inactive Publication Date: 2006-12-20
SHARP KK
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Therefore, the suggested driving method of inverting the polarity of the data signal for each source lead, while effective for black and white displays, is ineffective at reducing interference for normal color displays

Method used

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  • Transmission type liquid crystal display device and method for fabricating the same
  • Transmission type liquid crystal display device and method for fabricating the same
  • Transmission type liquid crystal display device and method for fabricating the same

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0076] figure 1 is a plan view of one pixel portion of the active matrix substrate of the transmissive liquid crystal display device according to Embodiment 1 of the present invention.

[0077] see figure 1 , the active matrix substrate includes a plurality of pixel electrodes 21 arranged in a matrix. A gate wiring 22 supplying a scan (gate) signal and a source wiring 23 supplying an image (data) signal run around the pixel electrode 21 and cross each other. The periphery of each pixel electrode 21 is overlapped on the gate lead 22 and the source lead 23 . TFTs 24 functioning as switching elements connected to the corresponding pixel electrodes 21 are formed at intersections of the gate wiring 22 and the source wiring 23 . The gate of the TFT 24 is connected to the gate lead 22 so that a gate signal can be input to the gate to control and drive the TFT 24 . The source of the TFT 24 is connected to the source lead 23 so that a data signal can be input to the source. The ...

Embodiment 2

[0096] In Embodiment 2, another method of forming the interlayer insulating film 38 will be described.

[0097] The fabrication process up to the formation of the transparent conductive films 37a and 37a' and the metal layers 37b and 37b' by sputtering and patterning is the same as that described in Embodiment 1. Then, in this example, a non-photosensitive organic thin film was formed on the resulting structure by spin coating. A photoresist is then formed on the film and a pattern is printed. The organic thin film is etched using a patterned photoresist to obtain an interlayer insulating film 38 , and a contact hole 26 is formed through the interlayer insulating film 38 . On the other hand, non-photosensitive organic films can be formed by CVD instead of spin coating.

[0098] Examples of non-photosensitive organic films include curable acrylates. More specifically, JSS-924 (2-component type acrylic resin) and JSS-925 (1-component type acrylic resin) manufactured by Nippon...

Embodiment 3

[0105] image 3 is a plan view of one pixel portion of the active matrix substrate of the transmissive liquid crystal display device according to Embodiment 3 of the present invention. Figure 4 is along image 3 The cross-sectional view of the B-B' line in the middle. Parts having the same function and effect are used with figure 1 and figure 2 are denoted by the same reference numerals as used in , and their descriptions are omitted.

[0106] In the active matrix substrate of this example, each contact hole 26a is formed on the storage capacitor electrode 25a and the storage capacitor sub-electrode 27 of the storage capacitor of each pixel. As described in Example 1, the storage capacitor electrode 25a forms the terminal of the connection electrode 25, which is connected to the drain 36b of the TFT 24. Another electrode of the energy storage capacitor (the secondary pole 27 of the energy storage capacitor) passes Figure 16 The storage capacitor common lines 6 are shown...

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Abstract

The transmission type liquid crystal display device of this invention includes: gate lines; source lines; and switching elements (24) each arranged near a crossing of each gate line and each source line, a gate electrode (32) of each switching element (24) being connected to the gate line, a source electrode (36a) of the switching element (24) being connected to the source line, and a drain electrode (36b) of the switching element (24) being connected to a pixel electrode (21) for applying a voltage to a liquid crystal layer, wherein an interlayer insulating film (38) formed of an organic film with high transparency is provided above the switching element (24), the gate line, and the source line, and wherein the pixel electrode (21) formed of a transparent conductive film is provided on the interlayer insulating film (38).

Description

[0001] This application is a divisional application with a filing date of August 12, 1996, an application number of 02159891.6, and an invention title of "transmissive liquid crystal display device and its manufacturing method". technical field [0002] The present invention relates to a kind of transmissive liquid crystal display device, and it comprises switching element, as thin film triode (hereinafter referred to as TFT) as addressing element, and is used as the display of computer, television and so on; The present invention also relates to a kind of manufacture This transmissive liquid crystal display device method. Background technique [0003] Figure 16 It is a circuit diagram of an ordinary transmissive liquid crystal display device with an active matrix substrate. [0004] see Figure 16 , the active matrix substrate includes a plurality of pixel electrodes 1 arranged in a matrix, and a TFT 2 used as a switching element connected to each pixel electrode 1 . The ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02F1/136G02F1/1333
Inventor 島田尚幸梶谷優岡本昌也片山幹雄咲花由和山本明弘中田幸伸錦博彥近藤直文嵨田吉祐
Owner SHARP KK