Solid support having electrostatic layer and use thereof
a solid support and electrostatic layer technology, applied in the field of solid support having electrostatic layer, can solve the problems of limiting the change of temperature in an instant, consuming a lot of time, and consuming several hours to obtain the required amount of dna, so as to achieve the effect of significantly improving the bond strength to nucleic acid molecules and the immobilized amount of nucleic acid molecules
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example 1
Introduction of Amino Group-Containing Compound Into Chamber When Applying Surface-Treated Layer To Substrate (1)
[0079]DLC layer was formed at a thickness of 10 nm on a slide glass of 25 mm (width)×75 mm (length)×1 mm (thickness) by the ionization deposition method, at an accelerating voltage of 0.5 kV, using a mixed gas of 95% by volume of methane gas and 5% by volume of hydrogen gas as material. Then, using methane gas as a carrier gas, at the rate of 5 cm3 / minute, it was introduced into a chamber through the ethylenediamine incubated at 15° C. At a working pressure of 2 Pa and an accelerating voltage of 0.5 kV, using methane and ethylenediamine as material, a layer consisting of C, N and H was formed at a thickness of 10 nm.
[0080]Then, after butanetetracarboxyllc acid anhydride, as a polyvalent carboxylic acid, was condensed with the amino group in the surface-treated layer consisting of C, N and H formed with methane and ethylenediamine as material, it was activated by being dip...
example 2
Introduction of Amino Group-Containing Compound Into Chamber When Applying Surface-Treated Layer To Substrate (2)
[0086]To a slide glass of 25 mm (width)×75 mm (length)×1 mm (thickness) by the ionization deposition method, using methane gas as a carrier gas, at the rate of 5 cm3 / minute, it was introduced Into a chamber through the ethylenediamine incubated at 15° C. At a working pressure of 2 Pa and an accelerating voltage of 0.5 kV, using methane an. ethylenediamine as material, a layer consisting of C, N and H was formed at a thickness of 20 nm.
[0087]Then, after polyacrylic acid, as a polyvalent carboxylic acid, was condensed with the amino group in the surface-treated layer consisting of methane and ethylenediamine in the presence of 0.1 M 1-[3-(dimethylamino)propyl]-3-ethylcarbodiimide, it was activated by being dipped in an activation solution, in which 0.1 M 1-[3-(dimethylamino)propyl]-3-ethylcarbodiimide and 20 mM N-hydroxysuccineimide had been dissolved in 300 mL of 0.1 M pho...
example 3
Formation of Electrostatic Layer By Post-Treatment
[0092]DLC layer was formed at a thickness of 10 nm on a slide glass of 25 mm (width)×75 mm (length)×1 mm (thickness) by the ionization deposition method, at an accelerating voltage of 0.5 kV, using a mixed gas of 95% by volume of methane gas and 5% by volume of hydrogen gas as material.
[0093]Then, it was chlorinated by being irradiated with ultraviolet rays for 30 minutes in chlorine gas. Then, the substrate was dipped in a polyacrylic amine aqueous solution (0.1 g / L), whereby an electrostatic layer was formed.
[0094]Then, after polyacrylic acid, as a polyvalent carboxylic acid, was condensed with the amino group in the electrostatic layer in the presence of 0.1 M 1-[3-(dimethylamino) propyl]-3-ethylcarbodiimide, it was activated by being dipped in an activation solution, in which 0.1 M 1-[3-(dimethylamino)propyl]-3-ethylcarbodiimide and 20 mM N-hydroxysuccineimide had been dissolved in 300 mL of 0.1 M phosphate buffer (pH 6), for 30 ...
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