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Manufacturing execution system and manufacturing system having virtual measuring function

A technology of manufacturing execution system and virtual measurement, applied in semiconductor/solid-state device manufacturing, semiconductor/solid-state device testing/measurement, electrical components, etc. Real-time monitoring and other issues to achieve multi-machine production time, improve quality control and yield, and save the cost of testing wafers

Active Publication Date: 2014-08-20
NAT CHENG KUNG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0005] However, the SPC online process monitoring 30 can only sample a piece of sampled workpiece 12 from multiple workpieces 10, and cannot perform workpiece-to-workpiece (W2W) piece-by-piece full inspection on all workpieces 10, and needs to wait The sampling workpiece 12 can only be monitored after the measurement is completed, and real-time monitoring cannot be performed
The SPC offline machine monitoring 32 needs to use multiple pieces of test workpieces 14, which not only increases the production cost, but also takes up valuable production time of the process machine 20, and the test workpieces 14 cannot accurately represent the quality of the workpieces 10 in production

Method used

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  • Manufacturing execution system and manufacturing system having virtual measuring function
  • Manufacturing execution system and manufacturing system having virtual measuring function
  • Manufacturing execution system and manufacturing system having virtual measuring function

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Embodiment Construction

[0020] Generally, each subsystem of the manufacturing execution system, such as the statistical process control system, the alarm manager, the sequencer, etc., all need to input the actual measurement values ​​generated by the measuring machine to perform their respective functions. The embodiment of the present invention mainly integrates the virtual measurement system into the manufacturing execution system, so that the virtual measurement value calculated by the virtual measurement system is used to replace the actual measurement value generated by the measuring machine, and becomes the sub-system of the manufacturing execution system. enter.

[0021] Embodiments of the present invention can use any virtual measurement system constructed by an algorithm, for example: the "two-stage virtual measurement method" disclosed in Taiwan Patent No. 200849345; Virtual Measurement (Automatic Virtual Metrology; AVM)" system. The characteristics of these two virtual measurement systems...

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Abstract

The invention discloses a manufacturing execution system and a manufacturing system having a virtual measuring function. The manufacturing execution system is established on the basis of configurations of middleware, such as an object request broker, an equipment manager, a virtual measuring system, a statistical process control (SPC) system, an alarm manager, a scheduler and the like. The manufacturing system comprises a first process cabinet, a second process cabinet, a measuring cabinet, the manufacturing execution system, a first run-to-run (R2R) controller and a second R2R controller.

Description

technical field [0001] The present invention relates to a manufacturing execution system and a manufacturing system, in particular to a manufacturing execution system (Manufacturing Execution System; MES) and a manufacturing system with a virtual measurement function. Background technique [0002] The manufacturing execution system is an application software used to help enterprises actively collect and monitor the production data generated in the manufacturing process from receiving orders, conducting production, process control to product completion, so as to ensure the quality of products or workpieces. It can be a wafer in the semiconductor industry or a glass substrate in the TFT-LCD industry. In the MES, the Statistical Process Control (SPC) system is the main tool for maintaining and improving the quality of workpieces. The purpose of the statistical process control system is to effectively monitor the performance of the process over time to verify whether the proces...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/00H01L21/66
Inventor 郑芳田高季安黄宪成张永政
Owner NAT CHENG KUNG UNIV
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