Ti-Nb oxide sintered body sputtering target, Ti-Nb oxide thin film, and method for producing the thin film

A technology for oxide thin films and sintered bodies, which can be used in the manufacture of optical record carriers, sputter coating, recording/reproducing by optical methods, etc., can solve the problem of insufficient disclosure of technical content, insufficient research, and no mention of and other problems, to achieve the effect of excellent transmittance, less decrease in reflectivity, and improved film formation speed

Active Publication Date: 2012-02-29
JX NIPPON MINING & METALS CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

In these cases, the refractive index of the film for optical recording media should be important, but it is not mentioned at all.
Even considering many combinations, the refractive index varies depending on the composition, so it is assumed that sufficient research has not been carried out
In addition, in these documents, a sputtering target is used to form a thin film, and the properties of the thin film are strongly affected by the composition of the target and the properties of the target.
However, it is not disclosed in these documents, it is only a simple composition list, so the disclosure of its technical content is still not sufficient as a reference

Method used

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  • Ti-Nb oxide sintered body sputtering target, Ti-Nb oxide thin film, and method for producing the thin film

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1～5

[0064] As a raw material, prepare high-purity (4N) titanium oxide (TiO 2 ) And high purity (4N), niobium acid (Nb) with an average particle size of 3μm 2 O 5 ) The powder is blended with the composition ratio shown in the following table. Then, these powders with adjusted ingredients were mixed using a dry blender, and then calcined at 1000°C. After that, it was treated with a wet ball mill for about 20 hours, and finely pulverized to a particle size of 1 μm to prepare a slurry.

[0065] Then, the slurry was dried with a dryer, and then filled in a carbon mold and hot-pressed. The hot pressing conditions are: 1200℃, surface pressure 300kgf / cm 2 . The targets produced in this way all have a relative density of over 90%.

[0066] Through the above operations, a Ti-Nb-based oxide sintered body sputtering target having the composition shown in Table 1 can be obtained. As shown in Table 1, the resistivity of the target is 0.01 to 0.5 Ωcm. Perform XRD measurement on the sample taken ...

Embodiment 2

[0075] Regarding Example 2, the atomic ratio of Ti to Nb in both the target composition and the film composition is 0.57, which falls within the range of 0.39≦(Nb / (Ti+Nb))≦0.79 in the present invention. As a result, the resistivity is as low as 0.01Ωcm, and the film formation speed is as high as It is a sputtering target suitable for the purpose of the present application. In addition, the refractive index of the thin film is as high as 2.56, and the amount of refractive index variation is 0.007, which is stable, and the extinction coefficient is as low as 0.0001, which can form suitable interference films or protective films for optical recording media.

Embodiment 3

[0076] Regarding Example 3, the atomic ratio of Ti to Nb in the target composition is 0.67, and the atomic ratio of Ti to Nb in the film composition is 0.66, which falls within the range of 0.39≤(Nb / (Ti+Nb))≤0.79 in the present invention Inside. As a result, the resistivity is as low as 0.02Ωcm, and the film formation speed is as high as It is a sputtering target suitable for the purpose of the present application. In addition, the refractive index of the film is as high as 2.55, and the refractive index variation is 0.005, which is stable, and the extinction coefficient is as low as 0.0001, and can form suitable interference films or protective films for optical recording media.

[0077] Regarding Example 4, the atomic ratio of Ti to Nb in the target composition is 0.75, and the atomic ratio of Ti to Nb in the film composition is 0.75, which falls within the range of 0.39≤(Nb / (Ti+Nb))≤0.79 in the present invention Inside. As a result, the resistivity is as low as 0.05Ωcm, and...

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Abstract

Disclosed is a Ti-Nb oxide sintered body sputtering target which is characterized by being composed of titanium (Ti), niobium (Nb) and the balance made up of oxygen and unavoidable impurities, with the atomic ratio of Ti and Nb satisfying the following relation: 0.39 = (Nb / (Ti + Nb)) = 0.79. The Ti-Nb oxide sintered body sputtering target has high refractive index and low extinction coefficient. A Ti-Nb oxide thin film is obtained using the sputtering target, and the Ti-Nb oxide sintered body sputtering target is capable of forming a film at high rate. The thin film has excellent transmittance, while being suppressed in decrease or change of the reflectance. Consequently, the thin film is useful as an interference film of an optical information recording medium, a protective film, or a thin film that is used as a part of a constituent layer of an optical recording medium. In addition, the thin film can be applied to a glass substrate, in other words, the thin film can be used as a heat ray-reflecting film, an anti-reflection film or an interference filter.

Description

Technical field [0001] The present invention relates to a Ti-Nb-based oxide sintered body sputtering target capable of forming a thin film with a high refractive index and a low extinction coefficient at high speed, a Ti-Nb-based oxide thin film, and a method for manufacturing the thin film. Background technique [0002] In recent years, a high-density recording optical disc technology has been developed as a high-density optical information recording medium that can be rewritable without a magnetic head, and it has been rapidly commercialized. In particular, the CD-RW, which was launched in 1977 as a rewritable CD, is currently the most popular phase change optical disc. The number of erasing and writing of this CD-RW is about 1,000. [0003] In addition, DVD-RW developed as a DVD has also been commercialized, and the layer structure of the optical disc is basically the same or similar to that of CD-RW. The number of erasing and writing is about 1,000 to 10,000. [0004] These op...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/34C04B35/46G11B7/24G11B7/254G11B7/257G11B7/26G11B7/24062G11B7/2578
CPCC04B35/462C04B35/499C04B35/62222C04B35/6262C04B35/645C04B2235/3232C04B2235/3251C04B2235/5436G11B7/2578G11B7/266G11B2007/25706G11B2007/25715C04B35/495G11B7/24062C04B35/46
Inventor 高见英生矢作政隆
Owner JX NIPPON MINING & METALS CORP
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