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Intelligent full-automatic cleaning device for semiconductors

A cleaning device and fully automatic technology, applied in the fields of semiconductor/solid-state device manufacturing, electrical components, circuits, etc., can solve the problems of temperature change of cleaning solution, affecting cleaning effect, etc., so as to reduce the risk of product loss and improve process adaptability. Effect

Inactive Publication Date: 2013-03-06
DALIAN LIAN DA SCI & TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0010] The temperature of the cleaning solution in the existing product is different from that of the cleaning solution in the cleaning tank before filling. When the cleaning solution is added, the temperature of the cleaning solution in the cleaning tank will change, which will affect the cleaning effect.

Method used

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  • Intelligent full-automatic cleaning device for semiconductors
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Experimental program
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Embodiment Construction

[0029] figure 1 It is a structural schematic diagram of the present invention, such as figure 1 Shown: a kind of implementation method of embedded intelligent voice processing engine, comprising

[0030] The design of the wafer cleaning machine system adopts a modular design. According to the different cleaning process requirements put forward by the user, select a reasonable cleaning process module with the module as the core, and organically synthesize each module into a semiconductor device with one or more cleaning processes. The automatic washing machine system generally consists of six parts: skeleton body, cleaning process module, transmission system, laminar flow control system, electrical control system, and automatic acid distribution system.

[0031] In order to reduce pollution and reduce production costs, the system is generally divided into two different areas: the gray area and the clean area: for the parts that affect the quality of wafer cleaning, such as cl...

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PUM

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Abstract

The invention discloses an intelligent full-automatic cleaning device for semiconductors. The intelligent full-automatic cleaning device comprises an acid preparation system and a cleaning system, wherein the cleaning system is provided with framework bodies, cleaning process tanks, laminar flow control systems and transmission systems, the framework bodies are used for supporting the integral device, each cleaning process tank is mounted inside the corresponding framework body, each laminar flow control system is mounted in the corresponding cleaning process tank, controls a laminar flow structure of cleaning liquor in a cleaning module, and is connected with the corresponding cleaning process tank by the corresponding transmission system, and the cleaning liquor is delivered to each cleaning process tank via the corresponding transmission system. Remote system upgrading and repair are realized by the aid of a PLC (programmable logic control) system, each cleaning tank station is independently controlled, the technological adaptability of products is improved, an automatic shutdown function is realized when a fault occurs, negligence easily caused during manual equipment monitoring operation is avoided, risks of loss of the products are reduced, the liquor is pretreated before being injected, and accordingly influence of injection of new cleaning liquor to an environment in each tank is prevented.

Description

technical field [0001] The invention designs a cleaning device, in particular to an intelligent automatic semiconductor cleaning device. Background technique [0002] Current integrated circuit wafer cleaning machines are divided into automatic cleaning machines and manual cleaning machines, wherein the technical characteristics of the full-automatic wafer cleaning machine and the present invention are relatively close. The automatic wafer cleaning machine is mainly composed of a loading table, a cleaning part, a transfer manipulator, a rotating mechanism, an exhaust system and an electric control system. This equipment is a fully automatic processing equipment, which is displayed, detected and operated by a 10.4-inch large-screen touch screen, and the entire cleaning process is controlled by PLC. [0003] The basic actions of a fully automatic wafer cleaning machine include: [0004] 1. The workpieces to be processed are placed in baskets on the loading table, conveyed th...

Claims

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Application Information

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IPC IPC(8): H01L21/00
Inventor 李宾于跃刘建民钱军许元毅彭冲王宁宁
Owner DALIAN LIAN DA SCI & TECH