Exposure device
A technology of exposure device and control device, which can be applied in the direction of photolithography exposure device, microlithography exposure device, optics, etc., can solve the problems of high-speed damage and high-efficiency, and achieve the effect of practical and high-efficiency dust removal.
Active Publication Date: 2016-08-31
BEAC CO LTD
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Problems solved by technology
Therefore, in the roll-to-roll type exposure apparatus that should be able to achieve high-speed and efficient exposure, the speed and efficiency of the mask are greatly impaired.
Especially when higher-quality exposure is to be performed, since frequent dust removal of the mask is required, each time the dust removal of the mask is performed, it is necessary to perform the above-mentioned process every time, which will greatly damage the speed-up and high-efficiency. change
Method used
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Embodiment approach 1
[0043] figure 1 It is an overall configuration diagram shown for describing the exposure apparatus 10 according to the embodiment. in addition, figure 1 It is a figure which schematically shows the exposure apparatus 10 which concerns on Embodiment 1, and the illustration of the components which are not especially necessary for demonstrating the exposure apparatus 10 which concerns on Embodiment is abbreviate|omitted. Additionally, due to figure 1 Since it is a schematic diagram, the size of the actual components is not reduced at the same ratio, but the components are drawn exaggeratedly or further reduced.
[0044] like figure 1 As shown, the exposure apparatus 10 according to the embodiment includes: a transport mechanism unit 100 that intermittently transports a long sheet-like substrate W by a predetermined amount along the x-axis in the xy plane formed by the x-axis and the y-axis; and an exposure unit 200 , to expose the photosensitive surface A of the substrate...
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PROBLEM TO BE SOLVED: To provide an exposure apparatus based on a roll-to-roll system which can remove dust on a pattern surface of a mask plate automatically without influence on an exposure operation.SOLUTION: An exposure apparatus includes an exposure stage 240 which has an exposure table 241 holding a substrate W and is capable of ascending and descending with the substrate W along the z axis, a mask dust removal part 230 which removes dust on a pattern surface M of a mask plate 210 while moving within a movable range for reciprocation between a first position (on the rear side) separated at a specified interval from the rear-side end part of the mask plate 210 along the x axis and a second position (on the front side) separated at a specified interval from the front-side end part of the mask plate 210 along the x axis, a mask dust removal controller 400 controlling the reciprocation of the mask dust removal part 230 and an exposure stage controller 500 controlling the ascending and descending of the exposure stage 240.
Description
technical field [0001] The invention relates to an exposure device, which makes the photosensitive surface of the substrate face the pattern surface of the mask plate, and transfers the pattern on the substrate by exposing the photosensitive surface of the substrate. Background technique [0002] Conventionally, various exposure apparatuses are known in which a photosensitive surface of a substrate and a pattern surface of a mask plate face each other, and a pattern is transferred to a substrate by exposing the photosensitive surface of the substrate. In such an exposure apparatus, it is important to remove dust not only from the photosensitive surface of the substrate but also from the surface of the mask plate that faces the substrate (referred to as the pattern surface of the mask plate). This is because if dust exists on the pattern surface of the mask plate, the dust will be transferred together with the pattern formed on the mask during exposure, resulting in a defect ...
Claims
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IPC IPC(8): G03F7/20
CPCG03F7/20G03F7/70908H01L21/027
Inventor 河东和彦羽生慎一
Owner BEAC CO LTD