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Exposure apparatus

A technology of exposure device and control device, which is applied in the direction of photolithography exposure device, microlithography exposure equipment, optics, etc., can solve the problems of high speed and high efficiency of damage, and achieve the effect of practical and efficient dust removal

Active Publication Date: 2015-03-18
BEAC CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Therefore, in the roll-to-roll type exposure apparatus that should be able to achieve high-speed and efficient exposure, the speed and efficiency of the mask are greatly impaired.
Especially when higher-quality exposure is to be performed, since frequent dust removal of the mask is required, each time the dust removal of the mask is performed, it is necessary to perform the above-mentioned process every time, which will greatly damage the speed-up and high-efficiency. change

Method used

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Embodiment approach 1

[0043] figure 1 It is an overall configuration diagram shown for describing the exposure apparatus 10 according to the embodiment. in addition, figure 1 It is a figure which schematically shows the exposure apparatus 10 which concerns on Embodiment 1, and the illustration of the components which are not especially necessary for demonstrating the exposure apparatus 10 which concerns on Embodiment is abbreviate|omitted. Additionally, due to figure 1 Since it is a schematic diagram, the size of the actual components is not reduced at the same ratio, but the components are drawn exaggeratedly or further reduced.

[0044] Such as figure 1 As shown, the exposure apparatus 10 according to the embodiment includes: a transport mechanism unit 100 that intermittently transports a long sheet-like substrate W by a predetermined amount along the x-axis in the xy plane formed by the x-axis and the y-axis; and an exposure unit 200 , to expose the photosensitive surface A of the substr...

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Abstract

The invention provides an exposure apparatus which automatically removes dust from the pattern surface of a blocking plate without causing influence to exposure. In particular, the exposure apparatus comprises an exposure object carrying desk (240) and an exposure functioning desk (240) with a retaining plate (W). The exposure functioning desk can rise and lower with the substrate (w) along axle Z. The dust removing part (240) of the blocking part enables the back side end part (210a) of the blocking plate (210) and the front side end part (210b) of the blocking plate (210) to do reciprocating movement along axle X.

Description

technical field [0001] The invention relates to an exposure device, which makes the photosensitive surface of the substrate face the pattern surface of the mask plate, and transfers the pattern on the substrate by exposing the photosensitive surface of the substrate. Background technique [0002] Conventionally, various exposure apparatuses are known in which a photosensitive surface of a substrate and a pattern surface of a mask plate face each other, and a pattern is transferred to a substrate by exposing the photosensitive surface of the substrate. In such an exposure apparatus, it is important to remove dust not only from the photosensitive surface of the substrate but also from the surface of the mask plate that faces the substrate (referred to as the pattern surface of the mask plate). This is because if dust exists on the pattern surface of the mask plate, the dust will be transferred together with the pattern formed on the mask during exposure, resulting in a defect ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20
CPCG03F7/20G03F7/70908H01L21/027
Inventor 河东和彦羽生慎一
Owner BEAC CO LTD