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VAPORIZING container, vaporizer, and VAPORIZING DEVICE

A gasifier and container technology, applied in the field of heating gasification devices, can solve the problems of frequent output stop state and bad influence of semiconductor processing, and achieve the effect of maintaining compactness and large flow output

Inactive Publication Date: 2016-06-29
HORIBA STEC CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] In this way, when an emergency output stop mechanism is added to prevent overflow of the liquid material caused by excessive introduction, the output stop state will frequently occur, which will adversely affect the semiconductor process itself, so it cannot constitute a fundamental solution to the above-mentioned problems.
[0007] Moreover, the above-mentioned problems are not uncommon in storage-type gasification devices

Method used

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  • VAPORIZING container, vaporizer, and VAPORIZING DEVICE
  • VAPORIZING container, vaporizer, and VAPORIZING DEVICE
  • VAPORIZING container, vaporizer, and VAPORIZING DEVICE

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Embodiment Construction

[0044] Hereinafter, one embodiment of the present invention will be described with reference to the drawings.

[0045] (1) Outline of the gasification device 100 of the present embodiment

[0046] The gasification device 100 of this embodiment is incorporated in, for example, a semiconductor manufacturing system, and is used to supply a predetermined flow rate of material gas to a processing chamber of the semiconductor manufacturing system.

[0047] and if figure 1 As shown, the gasification device 100 includes: a gasifier 1, which vaporizes the introduced liquid material and outputs the material gas; a preheater 2, which preheats the liquid material and introduces it into the gasifier 1; Mechanism 3, controlling the flow rate of the liquid material introduced from the preheater 2 into the gasifier 1; and a mass flow controller 7, connected to the output port of the gasifier 1, controlling the quality of the material gas flow.

[0048] Next, each part of the gasification a...

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Abstract

This invention is a continuous type vaporizing device that makes it possible to output a large flow rate of the material gas stably while the vaporizing device is downsized. The vaporizing device comprises a vaporizing tank (11) that has a vaporizing chamber (11a) and that outputs a material gas that is produced by vaporizing the liquid material that is introduced into the vaporizing chamber (11a), a heater that promotes vaporization of the liquid material in the vaporizing chamber by heating the vaporization tank (11), and a partition wall (6) that partitions a lower space of the vaporizing chamber (11a) into a first lower space (11e) into which the liquid material is introduced first and a second lower space (11f) into which the liquid material that overflows from the first lower space (11e) is introduced.

Description

technical field [0001] The present invention relates to a heating type gasification device and the like for gasifying a liquid semiconductor material. Background technique [0002] The semiconductor material includes a semiconductor material that is liquid at room temperature and does not contain chlorofluorocarbons. When such a liquid semiconductor material is used in a semiconductor manufacturing system, it is necessary to use a heating type vaporizer that heats and vaporizes the liquid semiconductor material. [0003] As a representative gasification device for this purpose, for example, there is a storage type gasification device that stores a sufficient amount of material necessary for a predetermined process in a gasification container and gasifies it to output a material gas, and A continuous introduction type vaporization device that vaporizes a liquid material while continuously or intermittently introducing it into a vaporization container, and outputs it as a mat...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): F24H1/00F24H9/20F22B33/00F22B35/00
CPCF22B33/00F22B35/00F24H1/00F24H9/18F22B1/282F22B1/30F22B15/00
Inventor 田口明広矢田秀贵
Owner HORIBA STEC CO LTD