Color film substrate, manufacture method of color film substrate, liquid crystal display and display device

Abstract

The invention discloses a color film substrate, a manufacture method of the color film substrate, a liquid crystal display and a display device; a barrier wall pattern having a distance from its upper surface to the upper surface of a substrate base plate greater than a distance from the upper surface of a photoresist layer to the upper surface of the substrate base plate is formed above a black matrix in the peripheral area of the substrate base plate, and a flat layer covering the black matrix layer and the photoresist layer is formed in an area defined by a barrier wall by means of dripping method; since material for forming the flat layer by the dripping method has low viscosity, it can be guaranteed that material flows fully in the area defined by the barrier wall, the surface of the flat layer in the display area is distributed evenly, and the flat layer in the display area of the color film substrate is flatter. Therefore, by applying the color film substrate to liquid crystal displays, the liquid crystal display can provide improved displaying uniformity, and the quality of the liquid crystal display is improved accordingly.

Description

technical field [0001] The invention relates to the field of display technology, in particular to a color filter substrate, a manufacturing method thereof, a liquid crystal display and a display device. Background technique [0002] A liquid crystal display generally includes a color filter substrate and an array substrate oppositely arranged, and a liquid crystal layer located between the color filter substrate and the array substrate. At present, when the color filter substrate is prepared, such as figure 1 As shown, generally, the pattern of black matrix 02 is first formed on the base substrate 01; then, the photoresist layer 03 including blue B, green G and red R is formed on the base substrate 01 formed with the pattern of black matrix 02; Then a planarization layer 05 is formed on the base substrate 01 on which the black matrix 02 and the photoresist layer 03 are formed. [0003] However, since the current planarization layer is formed by the method of slit coating, ...

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Problems solved by technology

[0003] However, since the current planarization layer is formed by the method of slit coating, the viscosity of the planarization layer is relatively high during preparation, so there will be unevenness at the overlap of the black matrix layer and the photoresist layer, resulting in The surface of the planarization layer is uneven, which is not conducive to the subsequent diffusion of PI orientation night and liquid crystal orientation, thereby affecting the quality of the liquid crystal display

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