Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Crucible device

A crucible and inner cover technology, applied in metal material coating process, vacuum evaporation plating, coating, etc., can solve the problems of affecting the evaporation effect of workpieces or substrates, reducing the quality of workpieces or substrates, and polluting crucible chambers, etc. , to achieve the effect of reducing the probability of splashing, reducing the possibility of splashing, and enhancing the uniformity of heating

Inactive Publication Date: 2019-04-23
BOE TECH GRP CO LTD
View PDF6 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

During the process, the organic materials in the crucible are often prone to splashing due to uneven heating, which not only causes waste of organic materials, but also pollutes the chamber of the crucible, and even affects the evaporation effect of the workpiece or substrate. thereby reducing the quality of the workpiece or substrate

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Crucible device
  • Crucible device
  • Crucible device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0034] Embodiments of the present invention are described in detail below, examples of which are shown in the drawings, wherein the same or similar reference numerals designate the same or similar elements or elements having the same or similar functions throughout. The embodiments described below by referring to the figures are exemplary only for explaining the present invention and should not be construed as limiting the present invention. Also, detailed descriptions of known arts will be omitted if they are unnecessary to illustrate the features of the present invention.

[0035] see figure 1 with figure 2 , the crucible device 1000 of the present invention includes a container body 100 and a cover plate module 200 detachably connected to the upper end of the container body 100 . The interior of the container body 100 is hollow to form a chamber (not shown, the same below). The cover module 200 includes an inner cover 10 and an outer cover 20 . One of the inner cover p...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides a crucible device. The crucible device comprises a container body and a cover plate module. The cover plate module is detachably connected to the upper end of the container body in a covering mode. The cover plate module comprises an inner cover plate and an outer cover plate. One of the inner cover plate and the outer cover plate is provided with a plurality of vent holes and at least one evaporation plating through hole, and the other one is provided with at least one sheltering part capable of sheltering the evaporation plating through holes. Each sheltering part can shelter the at least one evaporation plating through hole. Moreover, the inner cover plate and the outer cover plate can rotate relatively so as to enable the sheltering parts to completely cover the evaporation plating through holes or enable the sheltering parts and the evaporation plating through hole to be staggered. By adopting the crucible device, splashed evaporation plating materials can be reduced; pollution to a crucible cavity and material waste can be avoided; the quality of finished evaporation plated products can be improved; and the cost can be saved.

Description

technical field [0001] The invention relates to the field of vapor deposition technology, in particular, the invention relates to a crucible device. Background technique [0002] Vacuum evaporation is a process in which the substance to be formed into a film (usually an organic material) is placed in a vacuum for evaporation or sublimation, so that it is deposited on the surface of the workpiece or substrate to form a film. The crucible is an important part of vacuum evaporation. It is a container for melting and refining metal liquids and organic materials for heating and reaction, which can ensure the smooth progress of evaporation and film formation. [0003] The traditional crucible device for evaporation is usually designed in a bowl or cup shape, and the organic material to be filmed is evaporated onto the workpiece or substrate through the outlet of the crucible. During the process, the organic materials in the crucible are often prone to splashing due to uneven heat...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/24
CPCC23C14/243
Inventor 刘晓云
Owner BOE TECH GRP CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com