A kind of array substrate and its preparation method, display device

Abstract

Embodiments of the present invention provide an array substrate, a manufacturing method thereof, and a display device, which relate to the field of display technology and can enhance exposure at gaps between touch signal lines and data lines. The method includes: forming an insulating film on the base substrate, and forming a strip-shaped barrier wall through a patterning process; wherein, the width of the barrier wall is less than or equal to that between the first metal trace and the second metal trace to be formed. The distance between them; form a conductive film on the retaining wall, and form the first metal wiring and the The second metal trace. It is used to fully expose the gap between the touch signal line and the data line.

Description

technical field [0001] The present invention relates to the field of display technology, in particular to an array substrate, a preparation method thereof, and a display device. Background technique [0002] With the development of display technology, touch panel (Touch Panel) technology has entered a period of rapid development. According to the setting position of touch electrodes, touch panel can be divided into external touch panel and built-in touch panel. Control screen can be divided into: external touch screen (On cell Touch Panel) and embedded touch screen (In Cell Touch Panel). Among them, the InCell touch screen can be further divided into a hybrid in-cell (HIC for short) touch screen and a full in-cell (Full In Cell, FIC for short) touch screen. [0003] In order to reduce the thickness of the display screen, FIC touch products, in which a touch sensor (Touch Sensor) is built into a thin film transistor (TFT for short), have become the main development direction...

AI Technical Summary

Problems solved by technology

[0004] However, for high-resolution (Pixels Per Inch, PPI for short) touch products, since the width of the space (Space) between the touch signal line 20 and the data line 10 is very small, the touch signal line 20 and the data line During the exposure process of the line 10, the problem of underexposure at the gap between the touch signal line 20 and the data line 10 often occurs

When the photoresist is a positive photoresist, if the exposure is insufficient, the etching between the touch signal line 20 and the data line 10 will not be clean, which will cause the data line 10 and the adjacent touch signal line 20 to contact and short circuit ( short), resulting in defects; but if overexposure (expanding the exposure area), it will lead to the formation of thinner data lines 10 and touch signal lines 20, so that in the fanout (fan-out) area because the data lines 10 are thinner, thus It will cause the data line 10 to be easily broken, thereby affecting the normal light emission of a column of pixels connected to the broken data line

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