A vertical scanning device for an ion implanter

Abstract

The invention discloses a vertical scanning device for an ion implanter. The ion implanter includes a vacuum chamber and a target platform located in the vacuum chamber. The vertical scanning device includes a bracket, a main shaft, a first driving mechanism for driving the main shaft to go up and down, and a The second driving mechanism for driving the main shaft to rotate, the vacuum chamber is arranged on the support, the upper end of the main shaft is connected with the target platform, and the lower end of the main shaft extends outside the vacuum chamber and is connected with the first driving The mechanism is connected with the second driving mechanism. The invention has the advantages of reducing the occupied space of the vacuum process chamber, avoiding affecting the ultimate vacuum degree of the process chamber, and the like.

Description

technical field [0001] The invention relates to an ion implanter, in particular to a vertical scanning device for an ion implanter. Background technique [0002] Ion implanter is one of the key equipment in semiconductor process. In order to ensure the uniformity of the ion implantation dose, the ion implantation equipment generally needs to adopt a certain scanning mode. Due to the increasing size of silicon wafers and higher and higher requirements for ion implantation processes, it is difficult for the early batch-type target discs to meet the new process requirements, and single-chip implantation target platforms have gradually become the mainstream of current ion implanters. In this type of implanter system, the general requirement is that the ion beam is corrected by electric scanning and electromagnets in the horizontal direction, and finally reaches the target platform to diverge in parallel, that is, the ion beam remains stable in the horizontal direction, and then...

AI Technical Summary

Problems solved by technology

Its disadvantage is that most of the screw, guide rail pair, and driving parts in the motion mechanism are located in the vacuum process chamber, resulting in an excessively large volume of the vacuum process chamber, and the screw and guide rail pair need to be lubricated. The oil and grease will greatly affect the ultimate vacuum in the process chamber

In addition, the magnetic fluid seal and the linear motor plus air bearing to achieve vacuum isolation have defects such as complex structure, high cost, and regular maintenance.

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