Low-temperature polysilicon display panel, manufacturing method thereof, and liquid crystal display device

Abstract

Embodiments of the present invention provide a low-temperature polysilicon display panel, a manufacturing method thereof, and a liquid crystal display device, which relate to the field of display technology and effectively improve metal light leakage on the premise of ensuring high display performance. The above-mentioned low-temperature polysilicon display panel includes: an array substrate and a box substrate arranged oppositely, and a liquid crystal filled between the array substrate and the box substrate; wherein, the array substrate includes a base substrate, and the base substrate is sequentially arranged along the light emitting direction. Low-temperature polysilicon active layer, gate layer, and source-drain layer; the low-temperature polysilicon display panel also includes: a color filter layer, the color filter layer is arranged on the array substrate, and the color filter layer is located on the side of the source-drain layer facing away from the substrate substrate Side: light-shielding layer, the light-shielding layer is used to limit the opening area of ​​the low-temperature polysilicon display panel, at least part of the light-shielding layer is provided on the array substrate, and the light-shielding layer on the array substrate is located on the side of the source-drain layer facing away from the base substrate.

Description

【Technical field】 [0001] The invention relates to the field of display technology, in particular to a low-temperature polysilicon display panel, a manufacturing method thereof, and a liquid crystal display device. 【Background technique】 [0002] Low Temperature Poly-silicon (LTPS for short) display panels have the advantages of high resolution, fast response, high brightness, etc., and have been more and more widely used. For the LTPS liquid crystal display panel, it includes an array substrate and a color filter substrate that are oppositely arranged, wherein the array substrate is provided with a thin film transistor layer, and the color filter substrate is provided with a color filter layer and a black matrix. However, if the panel with this structure is applied to a curved screen, after the color filter substrate and the array substrate are bent, the relative positions of the two will be shifted, resulting in the metal layer in the array substrate being exposed on the co...

AI Technical Summary

Problems solved by technology

However, if the panel with this structure is applied to a curved screen, after the color filter substrate and the array substrate are bent, the relative positions of the two will be shifted, causing the metal layer in the array substrate to be exposed on the color filter substrate and formed by the black matrix. Metal light leakage occurs in the limited opening area

[0003] At present, due to the limitation of LTPS display panel process factors, it is difficult to use COA (Color filter on Array) technology to improve this problem. The only way to reduce the possibility of metal layer exposure in the opening area is to reduce the area of ​​the opening area. However, due to The pixel density of the LTPS display panel is relatively high, and the opening area of ​​a single sub-pixel is inherently small. Improving the phenomenon of metal light leakage by sacrificing the aperture ratio will have a great impact on the display of the LTPS display panel.

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