Lithographic apparatus and device manufacturing method

A device and lithography technology, applied in the field of device manufacturing, can solve unpredictable and unexpected problems

Active Publication Date: 2006-08-30
ASML NETHERLANDS BV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This requires additional or more powerful electric motors, and turbulence in the liquid may cause undesirable and unpredictable effects

Method used

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  • Lithographic apparatus and device manufacturing method
  • Lithographic apparatus and device manufacturing method
  • Lithographic apparatus and device manufacturing method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0024] figure 1 A lithographic apparatus according to an embodiment of the present invention is schematically shown. The unit includes:

[0025] an illumination system (illuminator) IL configured to adjust a radiation beam B (eg UV radiation or DUV radiation);

[0026] a support structure (eg, mask table) MT configured to support a patterning device (eg, a mask) MA, connected to a first positioning device PM configured to accurately position the patterning device according to certain parameters;

[0027] a substrate table (such as a wafer table) WT configured to hold a substrate (such as a resist-coated wafer) W connected to a second positioning device PW configured to accurately position the substrate according to certain parameters; and

[0028] A projection system (eg a refractive type projection lens system) PL configured to project the pattern applied to the radiation beam B by the patterning device MA onto a target portion C of the substrate W (eg comprising one or m...

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Abstract

Various types of pressure regulating devices are disclosed to reduce a pressure gradient in a liquid supply system of a lithographic apparatus, the liquid supply system having a liquid confinement structure configured to at least partially confine a liquid between a projection system and a substrate table of the lithographic apparatus. A high pressure gradient may cause particulate contamination in the liquid supply system and / or liquid confinement structure. A pressure gradient can be reduced by, for example, the use of slow switching in one or more valves, a bleed flow around or through one or more valves, diversion of liquid to a drain rather than or in addition to switching a valve off, a pressure regulator or flow restrictor to prevent shock waves, and a buffer volume / damper to compensate for pressure fluctuation.

Description

technical field [0001] The invention relates to a photolithography device and a device manufacturing method. Background technique [0002] A lithographic apparatus is a machine that can apply a desired pattern on a substrate, usually a target portion of the substrate. A lithographic apparatus may be used, for example, in the manufacture of integrated circuits (ICs). In this case, a patterning device, also known as a mask or reticle, may be employed to generate the circuit pattern to be formed on the individual layers of the IC. The pattern can be transferred to a target portion (eg, comprising one or more dies) on a substrate (eg, a silicon wafer). Transfer of the pattern is usually accomplished by means of imaging onto a layer of radiation-sensitive material (resist) provided on the substrate. Typically, a single substrate contains a network of adjacent target portions that are successively patterned. Known lithographic apparatuses include so-called steppers, in which e...

Claims

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Application Information

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Patent Type & AuthorityApplications(China)
IPC IPC(8): G03F7/20H01L21/027
CPCG03F7/709G03F7/70341E02D29/1427E02D2600/20
InventorM·K·斯塔文加J·H·W·雅各布斯H·詹森M·C·M·维哈根
OwnerASML NETHERLANDS BV