48 results about "Particulate contamination" patented technology

The clamping type mechanical arm capable of preventing particulate matter pollution comprises a finger piece, a telescopic device, a palm box and a double-push-rod assembly, the finger piece is connected to the front end of the palm box, a first limiting part is arranged at the fingertip of the finger piece, stroke openings are formed in the side walls of the two sides of the palm box, and a second limiting part is arranged at the tail end of the palm box. The telescopic device is arranged in the palm box, and the linkage end of the double-push-rod assembly is arranged in the palm box and connected with the telescopic end of the telescopic device, so that the double-push-rod assembly is limited by the stroke distance of the stroke opening to conduct telescopic displacement, and the clamping distance between the clamping end of the double-push-rod assembly and the first limiting part of the finger piece is adjusted. Therefore, fine particles in the manipulator are prevented from overflowing to pollute wafers.

The invention discloses a high-pressure gas particle counter taking a laser diode as a light source, which comprises an optical detection unit used for generating laser, dividing the laser into a main light path and an auxiliary light path which are independent, respectively irradiating a main detection area and an auxiliary detection area, receiving a particle scattered light signal and converting the particle scattered light signal into an electric signal; the gas path system is used for selectively conveying to-be-detected high-pressure gas and standard particle gas to the main detection area and the auxiliary detection area; the invention belongs to the technical field of gas particulate matter pollution monitoring, and aims to solve the problem of measurement basis misalignment caused by drifting of output light power of a laser diode along with working time increase and temperature change in the prior art. A set of real-time online dynamic calibration mechanism is constructed; the problem of measurement reference drift caused by factors such as light source aging and temperature drift is effectively solved.

This application provides a liquid-source gas-phase transport system and method, relating to the semiconductor field. The liquid-source gas-phase transport system includes a storage device, a reaction device, and a transport pipeline. The storage device includes a container and a container heating assembly, which heats the container to vaporize the liquid raw material within it. The transport pipeline connects the container and the reaction chamber of the reaction device. The transport pipeline includes an inner tube, an outer tube sleeved around the inner tube, and a pipeline heating assembly disposed outside the outer tube. A protective gas is filled between the outer and inner tubes, and the interior of the inner tube is used to transport the gaseous raw material. The liquid-source gas-phase transport system and method provided in this application can uniformly heat the raw material, reducing the likelihood of condensation and particulate contamination. Furthermore, the liquid-source gas-phase transport system and method offer superior safety.

The invention relates to the technical field of oil sampling, in particular to an oil taking device for an anti-fouling transformer, which comprises a transformer, an oil taking port and a quick-connection oil taking component, the quick-connection oil taking component is arranged on the oil taking port of the transformer, and the quick-connection oil taking component is arranged on the oil taking port of the transformer. The quick-connection oil taking assembly can be quickly connected with an oil taking opening of the transformer and can guide and convey insulating oil in the transformer in a closed mode, the oil removing mechanism is arranged on the quick-connection oil taking assembly, the pipe cleaning mechanism is arranged on the quick-connection oil taking assembly, and the oil removing mechanism is arranged on the quick-connection oil taking assembly. According to the sampling mode, the insulating oil directly reaches a designated position through a completely closed space to complete sampling, so that the possibility that the sample oil is exposed in the air is thoroughly solved, the condition that the oil sample is polluted by moisture and particulate matters in the air is effectively prevented, the reliability and accuracy of final test data are ensured, and the test data distortion is prevented; and the health condition of the transformer can be well monitored, and potential faults can be pre-judged.

The application discloses a high-pressure gas particle counter with a laser diode as a light source, which comprises an optical detection unit, a gas path system and a standard particle reference system, wherein the optical detection unit is used for generating laser and dividing the laser into two independent light paths, i.e., a main light path and an auxiliary light path, and is used for irradiating a main detection area and an auxiliary detection area respectively and receiving a particle scattering light signal and converting the particle scattering light signal into an electric signal; the gas path system is used for selectively conveying a high-pressure gas to be measured and a standard particle gas to the main detection area and the auxiliary detection area; the application belongs to the technical field of gas particulate pollution monitoring, and aims to solve the problem that the output light power of a laser diode in the prior art will drift with the increase of working time and the change of temperature, thereby causing the measurement reference to be inaccurate, and achieves the technical effect that a real-time online dynamic calibration mechanism is constructed by introducing an auxiliary reference light path and the standard particle reference system, and the problem of the measurement reference drift caused by factors such as light source aging and temperature drift is effectively overcome.

This disclosure provides a method, system, and epitaxial wafer for improving particulate contamination of silicon wafers during epitaxy. The method includes: selecting at least one test silicon wafer from a batch of silicon wafers to be processed, and determining a target power range to be applied to the epitaxial furnace based on the test results of the test silicon wafer; adjusting the effective power applied to the epitaxial furnace to the target power range before the silicon wafer to be processed is fed into the epitaxial chamber of the epitaxial furnace, so that the temperature inside the epitaxial chamber is within a target temperature range; maintaining the effective power of the epitaxial furnace within the target power range until the silicon wafer to be processed enters the epitaxial chamber, thereby using the target temperature range to suppress thermal deformation of the silicon wafer to be processed; and growing an epitaxial layer on the surface of the silicon wafer to be processed after it enters the epitaxial chamber. This disclosure can effectively reduce particulate contamination of the silicon wafer to be processed during epitaxy.

The invention provides a wafer suction cup structure and plasma etching equipment. The upper surface of the wafer suction cup structure is used for bearing a wafer, a gas channel used for conveying cooling gas to the position below the wafer is arranged in the wafer suction cup structure, and the wafer suction cup structure is characterized in that in the conveying direction of the cooling gas, the gas channel comprises a first section and a second section which are communicated, and the second section is formed on the upper surface of the wafer suction cup structure; the aperture of the first section is larger than that of the second section, a first porous plug of a porous structure is arranged in the first section, cooling gas can flow through the first porous plug to enter the second section, and a transition layer is arranged on the top of the first porous plug and located between the first porous plug and the top wall face of the first section. Therefore, the gas channel of the second section is prevented from being polluted by particulate matters formed by friction between the first porous plug and the top wall surface of the first section. The method is used for preventing particles formed by friction of the surface of the porous plug from entering the process cavity to pollute the wafer.

To provide deposition methods and apparatus for conditioning a process kit to increase process kit lifetime.SOLUTION: A nitride film formed on a process kit is exposed to conditioning process comprising nitrogen and hydrogen radicals to condition the nitride film to decrease particulate contamination from the process kit.SELECTED DRAWING: Figure 1

The invention discloses a surface particle pollution detection method, which comprises the following steps of: directly collecting particles on the surface of a target object, and transferring the particles attached to the surface of a collector to a filter membrane which is more convenient to analyze through extraction and filtration operations; and further determining the number and the size of the particulate matters in each size range through a microscopic analysis technology, and finally inputting the data for the particulate matters into a pre-trained target model to calculate the coverage rate of the surface particulate matters so as to obtain a final determination result for the surface particulate matters of the target object. According to the method, the coverage rate for evaluating the particulate matters on the surface of the target object is obtained through calculation of the pre-trained model, human factors are not doped, the target model is obtained after multiple times of training, the calculation accuracy and stability can be guaranteed, and the calculation efficiency is improved. In addition, complicated operation is not needed in the process of detecting the particles on the surface of the target object, so that the detection efficiency can be improved.

The spray head proposed in this application includes: a shaft with a central through hole for introducing gas, the shaft passing through a window in the top wall of a processing chamber; a gas receiving chamber disposed below the shaft; a leveling mechanism mounted above the window and connected to the top end of the shaft; and a corrugated tube sleeved on the outside of the shaft, with its two ends connected to the leveling mechanism and the top wall, respectively. A groove is provided on the area of ​​the shaft covered by the corrugated tube, the groove surrounding the outside of the shaft. An air inlet is provided on the side wall of the corrugated tube for introducing purge gas into the space between the groove and the side wall of the corrugated tube. This application can purge the process gas inside the corrugated tube downwards, preventing the process gas from generating particulate contamination of the substrate on the corrugated tube.

This disclosure provides a silicon wafer testing method, system, equipment, and silicon wafer processing method. The silicon wafer testing method includes: measuring each silicon wafer individually based on first preset measurement parameters to obtain the wafer's specifications, including at least one of particulate contamination degree, edge integrity, surface flatness, nano-morphology, and wafer thickness; determining whether the specifications meet a first target threshold corresponding to a first target level; if the determination result is that the specifications do not meet the first target threshold, performing a simulation test on the silicon wafer based on the specifications to predict whether the predicted specifications meet a second target threshold corresponding to a second target level under second preset measurement parameters; if the prediction result is that the predicted specifications do not meet the second target threshold, reworking or scrapping the silicon wafer. The silicon wafer testing method, system, equipment, and silicon wafer processing method disclosed herein improve equipment capacity and effective utilization rate.

This utility model discloses a multi-link linkage vacuum chamber switch baffle, which includes a base, a drive mechanism, a linkage assembly, and a baffle body. The linkage assembly achieves folding and storage of the baffle body through a multi-link hinge structure, reducing space occupation; the baffle body adopts a double-layer structure and a corrugated sealing gasket design to improve sealing performance and prevent particulate contamination; a lubrication device is provided in the base groove to reduce frictional resistance; a dust cover is provided at the hinge point to adsorb particles and protect the vacuum environment. This application can significantly save space, improve sealing performance and operational stability, while avoiding contamination of the vacuum environment, and is suitable for compact equipment.

The application provides a clogging control method and device of a water and fertilizer integrated system and the water and fertilizer integrated system, and belongs to the technical field of agricultural irrigation. The method comprises the following steps: determining the suspended particulate matter pollution risk, non-particulate matter pollution risk and chemical scaling risk of a water and fertilizer mixed solution based on real-time operation parameters of the water and fertilizer integrated system; performing sequential judgment logic on the suspended particulate matter pollution risk, non-particulate matter pollution risk and chemical scaling risk to determine whether a target enhanced clogging control mode is triggered; and when any trigger condition in the sequential judgment logic is reached, the water and fertilizer integrated system is controlled to enter the target enhanced clogging control mode. The application overcomes the defects of the prior art, such as the dependence on a single index and passive response, by means of the precise identification and hierarchical response to different levels of composite risks through the sequential judgment logic based on the collaborative evaluation of various clogging risk sources, so that the clogging control is more prospective, timely and targeted.

The purification of monoalkyl tin trialkoxides and monoalkyl tin triamides are described using fractional distillation and / or ultrafiltration. The purified compositions are useful as radiation sensitive patterning compositions or precursors thereof. The fractional distillation process has been found to be effective for the removal of metal impurities down to very low levels. The ultrafiltration processes have been found to be effective at removal of fine particulates. Commercially practical processing techniques are described.

A sampling system for obtaining a sample of particulate contamination on a surface of an object. The sampling system comprises a sampling device and an applicator. The sampling device comprises a sampling plate having a tacky sampling surface on a first side of the sampling plate, and at least one mechanical connector on an opposite, second side of the sampling plate. The applicator comprises a handle portion, and an engagement portion configured to releasably couple to the at least one mechanical connector. The sampling system is configured to allow the tacky sampling surface to be pressed against the surface of the object and then removed.

New and improved container outlet valve closures are provided for medical solution containers. The closures are flexible and keep the solution in their containers until action is taken. By exerting a certain force on the closure, a pop-up valve is opened to allow the medical solution to flow from the container. The closures can be used with a variety of materials. The closure opening is easy to initiate and does not create particulate contamination of the medical solution. Closures are provided for both side wall mounted containers and trough containers.

This invention discloses a method for preparing high-density, low-defect yttrium oxide ceramic materials and their applications, comprising the following steps: (1) preparing ceramic blanks by using high-purity yttrium oxide precursor powder through a molding process; (2) heating the ceramic blanks obtained in step (1) to 800-900 ℃ at 1-5 ℃ / min in an oxidizing atmosphere and holding them for 15-30 h; (3) continuing to heat the material obtained in step (2) to 1080-1150 ℃ at 1-5 ℃ / min in an oxidizing atmosphere and holding them for a shorter holding time than in step (2); (4) cooling the material obtained in step (3) with the furnace to avoid thermal stress-induced cracks, thereby obtaining the high-density, low-defect yttrium oxide ceramic material. This invention improves the density and microstructure uniformity of the material, enhances surface chemical stability and defect repair, strengthens bulk crystallinity and thermal shock resistance, reduces the risk of particulate contamination and extends component life, and the process is energy-saving, environmentally friendly and highly operable.

The invention provides an infrared detector capable of electrically controlling adsorption of particulate matters and a manufacturing method thereof, and the infrared detector comprises a substrate which comprises a functional micro-bridge region and an electric adsorption micro-bridge region located at the periphery of the functional micro-bridge region; the plurality of functional microbridges are arranged on the substrate and located in the functional microbridge area; the electro-adsorption microbridges are arranged on the substrate and located in the electro-adsorption microbridge area, each electro-adsorption microbridge comprises an electro-adsorption bridge surface, the surface of each electro-adsorption bridge surface is provided with a conductive layer, and the conductive layers are electrically connected with a circuit in the substrate, so that when the electro-adsorption microbridges are powered on, the electro-adsorption bridge surfaces can electrically adsorb particles. According to the invention, particulate matters can be actively intercepted, the particulate matters are inhibited from moving towards the functional micro-bridge area, the particulate matters in the packaging cavity of the infrared detector are effectively controlled, and the failure of a device caused by particulate matter pollution is avoided, so that the yield and long-term stability of the device are improved, and the industrial problem that the micro-bridge structure fails due to particulate matter contamination or impact is solved.

The application discloses an unmanned aerial vehicle intelligent inspection method for particulate matter pollution prevention and control, which comprises the following steps: S1, aerial photography is performed to acquire particulate matter pollution source images, and a pollution source image identification model is generated; S2, aerial photography is performed to acquire particulate matter pollution control facility images, and a pollution control facility image identification model is generated; S3, relevant data is collected, and a particulate matter pollution source and particulate matter pollution control facility list and distribution map are generated; S4, a terminal intelligent control platform plans an unmanned aerial vehicle inspection route; S5, when particulate matter concentration data of a monitoring site reaches a warning value, an inspection operation is started; S6, data recorded by the unmanned aerial vehicle inspection is transmitted to the terminal in real time; S7, according to the transmitted data, the terminal identifies pollution source types, pollution degrees and pollution control facility states, and forms a pollution source inspection list; and S8, the generated list is automatically sent to relevant personnel. The application has high target recognition precision and accurate positioning, improves the inspection efficiency of particulate matter pollution prevention and control, and reduces labor costs.

This invention discloses a device and method for monitoring (detecting) the particulate contamination level of hydraulic oil by sampling from a drain valve, belonging to the field of hydraulic oil monitoring (detection) technology. It includes a circulation loop and a monitoring (detection) loop. The circulation loop includes a check valve and a hydraulic pump for providing power. One end of the check valve is connected to one end of a first filter, and the other end is connected to the oil inlet of the hydraulic pump (the connection must not be reversed). The oil outlet of the hydraulic pump is connected to the oil filling filter in the oil tank via a third pipe fitting. The monitoring (detection) loop includes a contamination level monitoring (detection) instrument, which is connected in parallel to the circulation loop. By setting up the circulation loop, the hydraulic oil flow in the pipeline before the check valve can be in a sufficiently turbulent state, thereby thoroughly mixing the contaminants deposited at the bottom of the oil tank or near the drain valve. A liquid sample representing the particulate contamination level of the oil tank and even the entire hydraulic system can be obtained at the drain valve.

The invention provides a particulate matter pollution degree calculation method and device, electronic equipment and a storage medium, and the method comprises the steps: determining a first lobster eye microporous optical device and a placement position thereof, and determining a first accompanying piece corresponding to the first lobster eye microporous optical device; after a certain period of time, measuring the changed ppm value of the first accompanying wafer; selecting a corresponding relation curve according to the placement position; and determining the effective area attenuation proportion of the first lobster eye micropore optical device according to the ppm increment value of the first accompanying piece and the relation curve. Compared with the prior art, the method has higher particulate matter pollution degree calculation accuracy and calculation efficiency.

This invention discloses a target substrate for use in coating equipment and its preparation method. The target substrate includes a base and a cylinder made of pure copper material, and the outer surface of the target substrate is provided with a tungsten layer or a molybdenum layer. This invention targets the placement of N-type or P-type oxide targets, forming a continuous and dense tungsten or molybdenum coating on the outer surface of the pure copper target substrate. While maintaining the high thermal and electrical conductivity of the target substrate, it significantly improves its surface resistance to ablation and sputtering contamination, solving the engineering pain points of existing pure copper substrates such as short lifespan, high particulate contamination, and frequent maintenance, and has significant promotional value.

This invention relates to a cleaning solution and cleaning method for removing the SiO2 film layer on the surface of silicon carbide. The cleaning solution comprises the following components by volume: 15-20% HF, 5-10% HNO3, 8-12% NH4F, 0.01-0.05% nonionic surfactant, and the remainder is ultrapure water. The mass concentration of HF is 49%, the mass concentration of HNO3 is 68%, and the mass concentration of NH4F is 30%. The cleaning method includes the following steps: (1) pre-cleaning the silicon carbide with ultrapure water; (2) performing main cleaning on the pre-cleaned silicon carbide using the above cleaning solution; (3) placing the main-cleaned silicon carbide into a 15-20% NH4OH / H2O2 mixed solution for neutralization and cleaning, then cleaning with an ultrapure water solution containing disodium ethylenediaminetetraacetate, and finally cleaning with a four-stage countercurrent ultrapure water rinsing system; (4) performing post-treatment cleaning in ultrapure water with an ozone content of 4-6 ppb, then rinsing with ultrapure water, and finally drying with isopropanol vapor. This method ensures that the silicon carbide surface is free of residue, has low particulate contamination, and is of high purity after cleaning, meeting the stringent requirements of semiconductor etching processes for the cleanliness and integrity of the material surface.

This invention provides a processing method, apparatus, and pressure control system for a pressure control system. The method includes: when a substrate is placed on a heating device, controlling the adsorption device to reduce the internal pressure of the adsorption device based on valves and pumps, thus adsorbing the substrate onto the heating device; controlling the adsorption device to restore the internal pressure of the adsorption device based on valves and pumps, thus desorbing the substrate onto the heating device; and controlling a temperature control device to adjust the temperature of the adsorption device's piping. This allows for substrate adsorption and desorption via the adsorption device, and the temperature control device regulates the temperature of the adsorption device's piping to ensure that the temperature of the adsorption device's piping does not meet the temperature requirements for thin film deposition, thereby hindering thin film deposition and solving the problems of pressure control system blockage and cavity particulate contamination, eliminating the need for frequent replacements.

A surgical treatment system for contaminated air streams having particulate contamination, polar contamination and / or nonpolar contamination in the gas or vapor stream. A surgical smoke plume treatment system and method provide or define a multi-stage treatment process that mechanically filters the air stream, followed by nonpolar decontamination and then polar decontamination or treatment. The system may be used stand alone or incorporated and used with other surgical instruments or incorporated into an air handler adapted to decontaminate an air stream. A desiccant may optionally be used to remove water from the air stream.

A filter device comprising at least two filter elements (10, 12), which are arranged in series when viewed in the direction of fluid flow, wherein one filter element (10) is used for removing particulate contamination and the other filter element (12) is used for separating gas, particularly air, wherein the filter element (12) for gas separation comprises at least two layers (24, 26), each having fluid passage holes of different sizes, and, when viewed in the direction of fluid flow, the layer (24) having larger fluid passage holes is positioned upstream of the layer (26) having smaller fluid passage holes.

The invention discloses an actual measurement-based rapid source tracing method for atmospheric particulate pollution, and belongs to the technical field of rapid source tracing methods for atmospheric particulate pollution. A regional particulate emission information base is established, and the information base comprises particulate emission amounts and spatial distribution of industrial, traffic, construction site dust raising and non-road mobile machinery departments; the method comprises the following steps: determining a particulate matter pollution period according to monitoring data or a forecast result; simulating regional meteorological characteristics of the pollution period by using a meteorological mode; acquiring meteorological data; determining a receptor position; and determining a pollution emission source area according to the pollution source identification parameters, and screening targeted prevention and treatment objects of particulate matter pollution.

The application discloses a kind of magnetic control sputtering film coating machine anti-particle pollution baffle structure, belong to magnetic control sputtering film coating field, including inner mounting plate and the target material of fixedly connected in inner mounting plate one side, further include the rotating part of being connected in inner mounting plate one side, the second baffle connected with rotating part, the first baffle at the lower end of second baffle, hollow cavity being opened in the inside of first baffle, multiple support frames being fixedly connected in first baffle one side, and another end of multiple support frames is fixedly connected on the outer surface of target material;Rotating part includes hollow guide rod being fixedly connected in target material and one end with inner mounting plate one side fixedly connected;Since first baffle is fixedly arranged and located above the edge of target material, most of large particles that are peeled off or splashed from the edge of target material, most of them will directly impact and adsorb on the bottom of first baffle, and cannot continue to fly to substrate, significantly reduce the probability that large particles directly reach substrate, improve the electrical, optical, mechanical properties and device reliability of thin film.

The invention discloses a particulate matter pollution prevention baffle structure of a magnetron sputtering coating machine, which belongs to the field of magnetron sputtering coating and comprises an inner mounting plate and a target fixedly connected to one side of the inner mounting plate. The rotating part is connected to one side of the inner mounting plate, the second baffle is connected with the rotating part, the first baffle is located at the lower end of the second baffle, the hollow cavity is formed in the first baffle, the multiple supporting frames are fixedly connected to one side of the first baffle, and the other ends of the multiple supporting frames are fixedly connected to the outer surface of the target material; the rotating part comprises a hollow guide rod which is fixedly connected in the target material, and one end of the hollow guide rod is fixedly connected with one side of the inner mounting plate; due to the fact that the first baffle is fixedly arranged and located above the edge of the target material, most of large particles which are peeled off from the edge of the target material or splashed out can directly impact and be adsorbed to the bottom of the first baffle and cannot continuously fly to the substrate, the probability that the large particles directly reach the substrate is remarkably reduced, and the service life of the target material is prolonged. And the electrical, optical and mechanical properties of the film and the device reliability are improved.

This invention discloses a clean granulation process for medical-grade polyetheretherketone (PEEK), comprising the following steps: Step 1, pretreatment and supercritical extraction: the medical-grade PEEK raw material is crushed into coarse particles and extracted using supercritical carbon dioxide fluid extraction; Step 2, combined surface modification: the extracted particles are subjected to sulfonation modification and low-temperature plasma combined modification. This clean granulation process for medical-grade PEEK utilizes supercritical extraction to deeply remove organic residues, a three-stage titanium alloy filter for precise impurity removal, and ultrapure water mist purification and cooling to strictly control metal ion and particulate contamination. Combined with an annular air knife to prevent melt carbonization black spots, the product has low metal residue, is free of foreign matter and volatile impurities, fully meeting the high cleanliness and biosafety requirements of medical implant-grade materials.