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51 results about "Ionic contamination" patented technology

Soldering flux for lead-free solder and preparation method of soldering flux

The invention relates to soldering flux for lead-free solder and a preparation method of the soldering flux. The soldering flux comprises, by mass, 2.0-4.0% of activating agent, 0.05-0.5% of surfactant, 0.4-1.0% of film-forming agent, 18-30% of cosolvent, 0.1-0.4% of corrosion inhibitor and the balance deionized water. The soldering flux is free of rosin and less than 3% in solid content, so that solid residual quantity is less during soldering, ionic contamination degree is low, and cleaning is avoided after soldering. By using the deionized water as solvent, the water-soluble no-clean soldering flux is colorless, transparent, free of pungent smell, easy in raw material getting approach and low in cost. Activating components in the soldering flux are halogen-free, so that insulativity of a soldered circuit board is improved; by the aid of the film-forming agent, a dense protecting film is formed on the surface of the circuit board after the film-forming agent is subjected to a soldering procedure, and accordingly, electromigration of soldered residues is lowered, and insulation stability of the circuit board is improved effectively; and harm caused when organic soldering flux is used for soldering can be reduced, and the soldering flux meets the environment-friendly requirements.
Owner:CENT SOUTH UNIV

Method for preparing micro intercommunicated hole structure transmission electron microscope sample

The invention discloses a method for preparing a micro intercommunicated hole structure transmission electron microscope sample. The method includes the steps that a hollow through hole is filled with adhesive diluted with acetone, the solidified adhesive covers the inner wall of the through hole, tissue of interface layers such as an insulation layer, a barrier layer and a copper seed layer on a through hole base body are protected and foreign matter is prevented from entering the through hole; then, according to the position of the through hole needing to be observed, after samples are ground from the upper surfaces and the lower surfaces to be within the range of hole depths needing to be inspected through thickness measurement, according to a conventional ion thinning method, the through hole region is aligned, thinned and perforated, a plane transmission electron microscope sample of the inner wall of the through hole is obtained, and then the tissue of the interface layers at different hole depths of the through hole samples is accurately positioned and represented. According to the method, ionic contamination cannot be introduced into the samples, a sample preparation device is simple, low in cost and convenient to operate, and a feasible plane sample preparation method is provided for through hole type micro-electronic interconnected structure and semiconductor device transmission electron microscope tissue observation.
Owner:INST OF METAL RESEARCH - CHINESE ACAD OF SCI

System and method for point-of-use filtration and purification of fluids used in substrate processing

ActiveUS7311847B2Reduce and eliminate particleReduce and eliminate and ionicIon-exchanger regenerationSemiconductor/solid-state device manufacturingElectricityFiltration
A method and system for supplying an ultra-pure fluid to a substrate process chamber using point-of-use filtration and purification. The method and system provide ability to automatically monitor and control contamination levels in fluids in real time and to stop substrate processing when contamination levels exceed predetermined thresholds. In one aspect, the invention is a system comprising: a fluid supply line adapted to supply a fluid to the process chamber; filtration means operably coupled to the fluid supply line for removing positively and negatively charged particles from the fluid prior to the fluid passing into the process chamber; a purifier operably coupled to the fluid supply line in series with the filtration means for removing ionic contaminants from the fluid prior to the fluid passing into the process chamber; sensor means for repetitively measuring particle and ionic impurity levels in the fluid that has passed through the filtration means and the purifier, the sensor means producing signals indicative of the measured particle and ionic impurity levels; a controller electrically coupled to the sensor means for receiving the signals created by the sensor means, the controller adapted to respectively compare the measured particle level and the measured ionic impurity level indicated by the signals to a predetermined particle threshold and a predetermined ionic impurity threshold, wherein upon the controller determining that either the measured particle level is above the predetermined particle threshold and / or that the measured ionic impurity level is above the predetermined ionic impurity threshold, the controller further adapted to (1) activate means to alert a user, (2) cease processing of substrates in the process chamber, and / or (3) prohibit processing of substrates in the process chamber.
Owner:AKRION TECH

Cleaning process and device for removing ionic contamination from PCB (printed circuit board)

The invention discloses a cleaning process and a cleaning device for removing ionic contamination from a PCB (printed circuit board). The cleaning process includes following flow paths of acid pickling, first multistage overflow water cleaning, ion removal cleaning, second multistage overflow water cleaning, drying and cooling. The cleaning device comprises a running roller conveyor belt used for conveying the PCB, wherein an automatic board placing machine is connected with the head end of the running roller conveyor belt, an acid pickling segment, a first multistage overflow water cleaning segment, an ion removal cleaning segment, a second multistage overflow water cleaning segment, a drying segment and a cooling segment are sequentially arranged on a passing path of the running roller conveyor belt, and an automatic board collection device is connected with the tail end of the running roller conveyor belt. The cleaning process and the cleaning device for removing the ionic contamination from the PCB improve cleaning effects of removing the ionic contamination from the PCB, and save labor cost, and the cleaning device can perform accurate parameter control, and the cleaning effects of the cleaning process for removing the ionic contamination from the PCB are further improved, and then ionic contamination degree of the PCB is further reduced, and furthermore PCB industry development is promoted.
Owner:江门市奔力达电路有限公司

Process for advanced treatment of coking wastewater and coupled fluorine ion removal

The invention provides a process for advanced treatment of coking wastewater and coupled fluorine ion removal. The process comprises the following steps: allowing biochemical effluent of the coking wastewater to enter a coagulation tank 1# from a raw water tank, adding 300-600 mg/L of a BH type advanced treatment agent into the wastewater, then performing stirring reaction, and then allowing the wastewater to enter a coagulation tank 2#, wherein the BH type advanced treatment agent is a composite agent which mainly comprises, in percentage by weight, 5-60 wt% of carbon powder, 2-50 wt% of a cyanogen removal agent and 20-60 wt% of a coagulant; adjusting a pH value in the coagulation tank 2# to 6-7, then adding a fluorine removal agent, carrying out sufficient stirring and reacting, and then allowing the wastewater to enter a coagulation reaction tank 3#, wherein the main component of the fluorine removal agent is calcium chloride, and the dosage of the fluorine removal agent is 900-2000 mg/L; adding 0.1-0.3% of polyacrylamide into the coagulation reaction tank 3#, carrying out slow stirring and uniform mixing, and allowing the wastewater to enter a sedimentation tank; and enabling solid to be formed through flocculation and sedimentation in the sedimentation tank, conducting solid-liquid separation, and allowing the treated wastewater to enter an effluent trough. The removal process disclosed by the invention is suitable for removing pollution factors such as low-concentration COD (Chemical Oxygen Demand), cyanide and fluorine ions in the wastewater and is a practical and simple agent treatment process.
Owner:上海宝汇环境科技有限公司
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