128 results about "Ionic impurity" patented technology

By repeating a purification process of a light-emitting organic compound several times, a thin film made of the light-emitting organic compound to be used in an EL display device contains ionic impurities at the concentration of 0.1 ppm or lower and has a volume resistivity in the range of 3×1010 Ωcm or larger. By using such a thin film as a light-emitting layer in the EL device, a current caused by reasons other than the carrier recombination can be prevented from flowing through the thin film, and deterioration caused by unnecessary heat generation can be suppressed. Accordingly, it is possible to obtain an EL display device with high reliability.

By repeating a purification process of a light-emitting organic compound several times, a thin film made of the light-emitting organic compound to be used in an EL display device contains ionic impurities at the concentration of 0.1 ppm or lower and has a volume resistivity in the range of 3×1010 Ωcm or larger. By using such a thin film as a light-emitting layer in the EL device, a current caused by reasons other than the carrier recombination can be prevented from flowing through the thin film, and deterioration caused by unnecessary heat generation can be suppressed. Accordingly, it is possible to obtain an EL display device with high reliability.

The present invention is related to a process of manufacturing rutile high-purity titania nano sols in a pure aqueous medium having no ionic impurities. In more detail, the present invention is related to a process for manufacturing titania nano sols, in which high-purity rutile titania nano particles are dispersed stably, through the hydrolysis of titanium tetraisopropoxide in an aqueous solution containing hydrogen peroxide (H2O2), and simultaneously with the hydrolysis, formation of peroxotitanate precursors, and hydrothermal treatment of them at 50-120° C.

An aim of the invention is to provide a cleaning member which causes no contamination of a substrate processing equipment by ionic impurities in the removal of foreign matters attached to the interior of the equipment through cleaning by the conveyance thereof into the equipment, a cleaning member which causes little contamination of a substrate processing equipment by metal impurities attributed to a protective film in the removal of foreign matters attached to the interior of the equipment through cleaning by the conveyance thereof into the equipment and a cleaning member which causes no contamination of a substrate processing equipment by metal impurities in the removal of foreign matters attached to the interior of the equipment through cleaning by the conveyance thereof into the equipment. The means for solving the aims of the invention concerns a cleaning sheet comprising a cleaning layer provided on one side of a base material, from which cleaning layer F−, Cl−, Br−, NO2−, NO3−, PO43−, SO42−, Na+, NH4+ and K+ are extractable with pure water each in an amount of not greater than 20 ppm (as extracted under boiling at 120° C. for 1 hour), and a pressure-sensitive adhesive layer provided on the other, a carrying material with cleaning capacity comprising the aforementioned cleaning sheet laminated on a carrying material with a pressure-sensitive adhesive layer and a method for cleaning a substrate processing equipment which comprises conveying the aforementioned carrying material with cleaning capacity into the substrate processing equipment; a cleaning sheet comprising a releasable protective film laminated on a cleaning layer, wherein the protective film is formed by a material from which metal elements such as Na, K, Ca, Mg, Al, Ti, Cr, Mn, Fe, Co, Ni, Cu and Zn or compounds thereof are transferred to a silicon wafer each in an amount of not greater than 1×1012 atoms / cm2 as calculated in terms of metal element when the protective film is brought into contact with (the mirror surface of) the silicon wafer at 23° C. for 1 minute, a carrying material with cleaning capacity comprising the aforementioned cleaning sheet laminated on a carrying material with a pressure-sensitive adhesive layer and a method for cleaning a substrate processing equipment which comprises conveying the aforementioned carrying material with cleaning capacity into the substrate processing equipment with the releasable protective film peeled off the cleaning layer; and a cleaning sheet comprising a cleaning layer provided on one side of a base material, which cleaning layer containing metal elements such as Na, K, Mg, Al, Ca, Ti, Cr, Mn, Fe, Co, Ni, Cu and Zn or compounds thereof each in an amount of not greater than 5 ppm (μg / g) as calculated in terms of metal element, and a pressure-sensitive adhesive layer provided on the other, a carrying material with cleaning capacity comprising the aforementioned cleaning sheet laminated on a carrying material with a pressure-sensitive adhesive layer and a method for cleaning a substrate processing equipment which comprises conveying the aforementioned carrying material with cleaning capacity into the substrate processing equipment.

A cleaning member which does not contaminate a substrate processing apparatus with an ionic impurity when conveyed into the apparatus for removing foreign materials within the apparatus is disclosed. A cleaning member which does not contaminate a substrate processing apparatus with a metallic impurity when conveyed into the apparatus for removing foreign materials within the apparatus is also disclosed. Specifically, a cleaning sheet characterized in that a cleaning layer wherein pure water extraction amounts (extracted for one hour while boiling at 120 1 / 2 C) of F<->, Cl<->, Br<->, NO2<->, NO3<->, PO4<3->, SO4<2->, Na<+>, NH4<+>, and K<+> are respectively 20 ppm or less is provided on one surface of a supporting body and an adhesive layer is provided on the other surface is disclosed. A cleaning sheet characterized in that a cleaning layer wherein respective contents of Na, K, Mg, Al, Ca, Ti, Cr, Mn, Fe, Co, Ni, Cu, Zn and compounds thereof are 5 ppm (mug / g) or less when calculated in terms of respective metal elements is provided on one surface of a supporting body and an adhesive layer is provided on the other surface is also disclosed.

In the electrodeionization deionized water producing apparatus, water is passed through a deionizing chamber(s) packed with an organic porous ion exchange material having a three-dimensional network structure to remove ionic impurities in the water, thereby producing deionized water. At the same time, a DC electric field is applied to the deionizing chamber(s) to discharge ionic impurities adsorbed on the organic porous ion exchange material outside the system, wherein the DC electric field is applied so that the ions to be discharged may electrophoretically move in the direction reverse to the flow of water through the organic porous ion exchange material.

The invention provides a driving method for a liquid crystal device, a liquid crystal device, and an electronic device with the liquid crystal device, which can effectively capture ion impurities in a liquid crystal layer. In the liquid crystal device (100), pixel electrodes (15) and a common electrode (23) that opposes the pixel electrodes (15) on another side of a liquid crystal layer (50) are formed in a display region (E1) serving as a first region, and dummy pixel electrodes (121, 122) serving as first electrodes are formed in a dummy pixel region (E2) serving as a second region. A driving method for the liquid crystal device (100) applies a voltage that is lower than a threshold voltage at which the transmissibility of liquid crystals changes between the dummy pixel electrodes (121, 122) and the common electrode (23). Accordingly, the dummy pixel electrodes (121, 122) can function as an electricity parting portion (120) and ionic impurities can be pulled from the display region (E1) to the dummy pixel electrodes(121, 122).

Disclosed is a printing ink comprising Cu- and / or CuO-containing metal nanoparticles, which obtains excellent dispersion properties and successive dispersion stability without using additives such as dispersing agents. Specifically disclosed is a printing ink that comprises Cu- and / or CuO-containing metal nanoparticles and has no more than 2,600 ppm of ionic impurities in the total solid content. The printing ink is obtained by dispersing the Cu- and / or CuO-containing metal nanoparticles, which have no more than 2,600 ppm of ionic impurities in the total solid content, in a dispersion medium.

Provided herein are a phenolic hydroxyl group-containing aromatic polyamide resin and a resin composition containing the resin, such as an epoxy resin composition containing an epoxy resin. The phenolic hydroxyl group-containing aromatic polyamide resin has a structure represented by the following formula (1):wherein m and n are average values satisfying the following formula: 0.005≦n / (m+n)<0.05, m+n is a positive value of 2 to 200, Ar1 is a bivalent aromatic group, Ar2 is a phenolic hydroxyl group-containing bivalent aromatic group, and Ar3 is a bivalent aromatic group. Such a phenolic hydroxyl group-containing aromatic polyamide resin has a low ionic impurity content and improved adhesive properties as well as excellent properties inherent in conventional phenolic hydroxyl group-containing aromatic polyamide resins, such as the ability to allow a cured epoxy resin composition to have excellent flexibility, electrical properties, flame retardancy, and the like.

In an element substrate of a liquid crystal device, in a peripheral region interposed between an image display region and a seal material, a peripheral electrode to which a potential is applied for trapping ionic impurities which is different from a common potential applied to a dummy pixel electrode or the like is formed. In the peripheral electrode, an electrode width of a first portion opposing a sealing material provided at a liquid crystal injection opening of the seal material is set to be greater than electrode widths of the other portions.

A method and system for supplying an ultra-pure fluid to a substrate process chamber using point-of-use filtration and purification. The method and system provide ability to automatically monitor and control contamination levels in fluids in real time and to stop substrate processing when contamination levels exceed predetermined thresholds. In one aspect, the invention is a system comprising: a fluid supply line adapted to supply a fluid to the process chamber; filtration means operably coupled to the fluid supply line for removing positively and negatively charged particles from the fluid prior to the fluid passing into the process chamber; a purifier operably coupled to the fluid supply line in series with the filtration means for removing ionic contaminants from the fluid prior to the fluid passing into the process chamber; sensor means for repetitively measuring particle and ionic impurity levels in the fluid that has passed through the filtration means and the purifier, the sensor means producing signals indicative of the measured particle and ionic impurity levels; a controller electrically coupled to the sensor means for receiving the signals created by the sensor means, the controller adapted to respectively compare the measured particle level and the measured ionic impurity level indicated by the signals to a predetermined particle threshold and a predetermined ionic impurity threshold, wherein upon the controller determining that either the measured particle level is above the predetermined particle threshold and / or that the measured ionic impurity level is above the predetermined ionic impurity threshold, the controller further adapted to (1) activate means to alert a user, (2) cease processing of substrates in the process chamber, and / or (3) prohibit processing of substrates in the process chamber.