The invention relates to the technical field of rotating target materials, in particular to a normal-
pressure atmosphere sintering method of a large-size ITO rotating target material, which comprises the following steps: placing a large-size ITO target material biscuit in a normal-pressure
sintering furnace, sealing the furnace body, and then carrying out pre-exhaust treatment in the furnace; a
sintering furnace temperature rising program is started, meanwhile,
oxygen atmosphere is introduced into the furnace, the
oxygen concentration and the gas flow are controlled to be kept stable, and the steps of pre-exhausting, multi-section temperature rising sintering, precise micropore exhausting and
oxygen atmosphere cooling are conducted. Normal-pressure
oxygen atmosphere sintering is adopted, compared with high-pressure
oxygen atmosphere sintering, high-pressure equipment is not needed, the equipment cost and the
production risk are reduced, and industrial large-scale production is easier; by controlling the oxygen concentration and flow, high-temperature
decomposition of SnO2 is effectively inhibited, the low-resistivity performance of the target material is ensured, the density is larger than or equal to 98.5%, the resistivity is smaller than or equal to 0.12 m
omega.cm, the cost is reduced, and industrialization is easy.