Semiconductor device and its production method

A semiconductor and device technology, applied in the field of semiconductor devices of active matrix liquid crystal displays, can solve the problems of shortening heating time, reducing the accuracy of mask plate position and the like, and the like
CN100501980CInactive Publication Date: 2009-06-17SEMICON ENERGY LAB CO LTD

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
SEMICON ENERGY LAB CO LTD
Publication Date
2009-06-17
Estimated Expiration
Not applicable · inactive patent

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Abstract

Nickel is introduced to a predetermined region of a peripheral circuit section, other than a picture element section, on an amorphous silicon film to crystallize from that region. After forming gate electrodes and others, sources, drains and channels are formed by doping impurities, and laser is irradiated to improve the crystallization. After that, electrodes / wires are formed. Thereby an active matrix type liquid crystal display whose thin film transistors (TFT) in the peripheral circuit section are composed of the crystalline silicon film whose crystal is grown in the direction parallel to the flow of carriers and whose TFTs in the picture element section are composed of the amorphous silicon film can be obtained.
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Description

[0001] This application is a divisional application of the application dated May 26, 1994, the application number is 99120260.0, and the invention title is "semiconductor device and its manufacturing method". technical field

[0002] The present invention relates to semiconductor devices of TFTs (Thin Film Transistors) mounted on an insulating substrate such as glass. In particular, it relates to semiconductor devices used in active matrix type liquid crystal displays. Background technique

[0003] Has a TFT mounted on an insulating substrate such as glass s Semiconductor devices used in active matrix liquid crystal displays, image sensors and similar devices, using TFT s are well known as motivating image elements.

[0004] Typically, TFTs made of thin-film silicon semiconductors are used in these devices. Thin-film silicon semiconductors can be roughly divided into two categories: one is made of amorphous (amorphous) silicon (α-S 1 ) is composed of semiconductors, and ...

Claims

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