Method for breeding broad leaf forest for scenery from youngling cut trunk

A cultivation method and landscape technology, applied in gardening methods, botanical equipment and methods, forestry, etc., can solve the problems of quality decline, growth stagnation, premature aging of young trees, etc., and achieve increased growth, vigorous growth, and young forests well-lit effect
CN101049075AInactive Publication Date: 2007-10-10杜宏彬
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
杜宏彬
Publication Date
2007-10-10
Estimated Expiration
Not applicable · inactive patent

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Abstract

A trunk truncating method for culturing the young broad-leaf trees to build a scenery forest features that the crown of each young tree is truncated to retain a lower trunk with 150-300 cm in height, 3-5 branches are retained, and the pruned tree is cultured for 1-2 years.
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Description

technical field

[0001] The invention relates to a method for truncating and cultivating trees, in particular to a method for truncating and cultivating broad-leaved landscape saplings to improve quality and value. Background technique

[0002] In the cultivation of woody plants, the method of cutting and drying is rarely used.

[0003] In tree afforestation, a small number of tree species are cut and dried, such as paulownia and sassafras for afforestation, all aboveground parts can be cut off. In order to reduce the water evaporation of seedlings and improve the survival rate of planting.

[0004] The mowing of the tea tree platform also cuts off the aboveground part in order to rejuvenate the old tree and form new plants. Its object is old tea tree.

[0005] My invention patent application number 2004100182699 "a kind of method for cultivating Kudingcha seedlings" has the content of cutting and drying. This patent refers to that 1 / 3 tip of nurse...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
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