Method for producing composite binding layer by using combination of plating and electro beam physics vapour deposition
A physical vapor deposition, electron beam technology, applied in the plating of superimposed layers, chemical instruments and methods, coatings, etc., can solve the problems of reducing the mechanical properties of ultra-high temperature alloy substrates, decreasing creep resistance, and harmful TCP, etc. Achieve the effect of avoiding the decline of high temperature mechanical properties and excellent high temperature oxidation resistance
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0112] The first step, substrate pretreatment
[0113] (A) The substrate is a Ni-based superalloy, the grade is K3, and the size is 8mm×9mm×3mm; each surface of the substrate is polished with 150#, 400#, and 800# SiC water abrasive paper to make the surface roughness of the substrate Ra <0.8;
[0114] (B) putting the substrate treated in step (A) into an alkaline cleaning solution at 60° C. for 5 minutes, and then rinsing it with deionized water for 3 times to obtain the first substrate;
[0115] The alkaline cleaning solution is composed of NaOH, Na 2 CO 3 、Na 3 PO 4 and deionized water, add 15g of NaOH and 15g of NaOH to 1L of deionized water 2 CO 3 and 15g of Na 3 PO 4 ;
[0116] (C) putting the first substrate obtained through the treatment in step (B) into 5% HCl for activation for 40 seconds, and then rinsing it twice with deionized water to obtain the second substrate;
[0117] The second step, electroplating the Ru layer
[0118] After the second substrate o...
Embodiment 2
[0163] The first step, substrate pretreatment
[0164] (A) The substrate is a Ni-based superalloy containing 4wt% Ru of the brand UM-F3, and the size is 9mm×9mm×3mm; each surface of the substrate is polished with SiC water abrasive paper of 150#, 400#, and 800# respectively, Make the substrate surface roughness Ra<0.8;
[0165] (B) putting the substrate treated in step (A) into an alkaline cleaning solution at 70° C. for 2 minutes, and then rinsing it twice with deionized water to obtain the first substrate;
[0166] The alkaline cleaning solution is composed of NaOH, Na 2 CO 3 、Na 3 PO 4and deionized water, add 30g of NaOH and 30g of NaOH to 1L of deionized water 2 CO 3 and 30g of Na 3 PO 4 ;
[0167] (C) putting the first substrate obtained through the treatment in step (B) into 5% HCl for activation for 60 seconds, and then rinsing it with deionized water for 3 times to obtain the second substrate;
[0168] The second step, electroplating the Ru layer
[0169] Af...
Embodiment 3
[0213] The first step, substrate pretreatment
[0214] (A) The substrate is a Ni-based single crystal alloy containing 2wt% Re, the grade is DD6, and the size is 8mm×9mm×3mm; each surface of the substrate is polished with SiC water abrasive paper of 150#, 400#, and 800# respectively, Make the substrate surface roughness Ra<0.8;
[0215] (B) putting the substrate treated in step (A) into an alkaline cleaning solution at 65° C. for 3 minutes, and then rinsing it with deionized water for 3 times to obtain the first substrate;
[0216] The alkaline cleaning solution is composed of NaOH, Na 2 CO 3 、Na 3 PO 4 and deionized water, add 10g of NaOH and 10g of NaOH to 1L of deionized water 2 CO 3 and 10 g of Na 3 PO 4 ;
[0217] (C) putting the first matrix obtained through the treatment in step (B) into 5% HCl for 20 seconds of activation, and then rinsing it twice with deionized water to obtain the second matrix;
[0218] The second step, electroplating the Ru layer
[0219...
PUM
| Property | Measurement | Unit |
|---|---|---|
| melting point | aaaaa | aaaaa |
| density | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
Login to View More 