Preparation method of surface print adsorbent of yeast template hollow silica-based material for adsorbing and separating strontium ions and application thereof

A silicon-based material, surface imprinting technology, applied in chemical instruments and methods, adsorption water/sewage treatment, other chemical processes, etc., to achieve good thermal stability, good mechanical properties and thermal stability, and large specific surface area

Inactive Publication Date: 2015-04-22
JIANGSU UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Using yeast as a template to prepare hollow silicon-based materials and introducing surface imprinting technology to obtain surface imprinted adsorbents for yeast-templated hollow silicon-based materials has not been reported yet.

Method used

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  • Preparation method of surface print adsorbent of yeast template hollow silica-based material for adsorbing and separating strontium ions and application thereof
  • Preparation method of surface print adsorbent of yeast template hollow silica-based material for adsorbing and separating strontium ions and application thereof
  • Preparation method of surface print adsorbent of yeast template hollow silica-based material for adsorbing and separating strontium ions and application thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0042] Use the improved ST? BER method to cover the surface of the yeast cells directly on the surface of the yeast cells, prepare yeast / silicon composite materials, and the specific preparation process is as follows: Weigh 15 G dry yeast, dissolved in NACL solution with a mass concentration of 60 ml of 60 mlIn the middle, settle 30 min to get the yeast suspension; take 4.0 mL yeast suspension, add 4.0 ml to remove ion water, and quickly stir for 10 min; add 16 mL water -free ethanol, the mixture ultrasonic 20 min to make the cell uniformly uniformlyDiversify; add 0.75 mL thick ammonia water and 2.0 ml orthodontic siliconic acid ethyl (TEOS), and the magnetic mixing and aging of 5.0 h at room temperature; filtering the product, cleaning the product 3 times with derived water water, after full drying at room temperature, it will be fully dry at room temperature.The product is fully grinded with a mantle, over 100 measuring sieves, and spare.

[0043] (2) Preparation of empty silico...

Embodiment 2

[0050] Use the improved ST? BER method to cover the surface of the yeast cells directly to prepare yeast / silicon composite materials. The specific preparation process is as follows: Weigh 15 G dry yeast, dissolved in a NACL solution with 0.8% mass concentration of 55 mlIn the middle, let's stand for 20 min to get the yeast suspension; take 3.5 mL yeast suspension, add 3.5 ml to remove ionic water, and quickly stir 8 min; add 14 mL water -free ethanol, and the mixture ultrasonic 15 min to make the cell uniformly uniformlyDiversify; add 0.65 mL thick ammonia water and 1.5 ml orthodontic siliconic acid ethyl (TEOS), and mix 5.0 h in the room temperature; filter the product, clean the product with deodorized water 3 times, and the room temperature will be fully dry and will be fully dry at room temperature.The product is fully grinded with a mantle, over 100 measuring sieves, and spare.

[0051] (2) Preparation of empty silicon -based materials (SSIY) in yeast templates

[0052] Set t...

Embodiment 3

[0058] Use the improved ST? BER method to cover the surface of the yeast cells directly to prepare yeast / silicon composite materials. The specific preparation process is as follows: Weigh 15 G dry yeast, dissolved in NACL solution with a mass concentration of 65 mlIn the middle, let the 40 min to get the yeast suspension; take 4.5 mL yeast suspension, add 4.5 ml to remove ion water, and quickly stir for 12 min; add 18 mL water -free ethanol, and the mixture ultrasonic 25 min to make the cell evenly uniformlyDiversify; add 0.75 mL thick ammonia water and 2.0 ml orthodontic siliconic acid ethyl (Teos), and the magnetic mixing and aging of 6.0 h at room temperature; filtering the product, cleaning the product with derived water 3 times, and the full drying at room temperature will be fully dry.The product is fully grinded with a mantle, over 100 measuring sieves, and spare.

[0059] (2) Preparation of empty silicon -based materials (SSIY) in yeast templates

[0060] Set the temperatu...

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Abstract

The invention belongs to the technical field of environmental material preparation and relates to a preparation method of surface print adsorbent of yeast template hollow silica-based material for adsorbing and separating strontium ions and application thereof. The technical scheme of preparation includes coating a yeast template surface with nanosilica particles to obtain yeast / silicon compound, removing yeast template to prepare yeast template hollow silica-based material through calcinations, using yeast template hollow silica-based material as a host material, divalent strontium ions as template ions, chitosan as functional monomer and gamma-(2,3glycidoxyprop) trimethoxypropylsilane as cross-linking agent and performing ionic imprinting polymeric modification by using suspension polymerization. The prepared adsorbent has the advantages of good mechanical property and heat stability, higher adsorption capacity and adsorption dynamics performance, low cost and large specific surface area and avoids the defects such as halfway elution and irregular microballoon shape due to too deep embedding of some template molecules to achieve the purpose of quickly, selectively and effectively adsorbing and separating divalent strontium ions.

Description

Technical field [0001] The present invention is the field of environmental materials preparation. It involves the surface printing adsorbent in the air -silicon -based material in yeast templates, especially the preparation method and application of the surface printing adsorbent in the ferrous silicon -based material of adsorption and separation ions. Background technique [0002] Molecular printing technology is based on target molecules (or ions) as a template. The functional monomer with complementary structures is formulated through reversible covalent or non -covalent bonds, and the cross -linked agent is added for polymer reaction. After the reaction is completed, the template molecule will beCutting from the polymer to form polymer materials that have specific recognition of template molecules.Surface printing technology is a new technology that prepares with molecular (ion) recognition capacity polymers. It has better solved some serious defects of traditional printing t...

Claims

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Application Information

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Patent Type & AuthorityPatents(China)
IPC IPC(8): B01J20/26B01J20/30C02F1/28C02F1/62C08J9/26
Inventor欧红香宋玉君潘建明黄卫红毛艳丽闫永胜
OwnerJIANGSU UNIV