Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Sesame and radix scutellariae interplanting method

A technology of sesame and scutellaria baicalensis, which is applied in the field of interplanting sesame and scutellaria baicalensis, can solve the problems of no income and low income of scutellaria baicalensis, achieve high returns, simple operation, and increase the emergence rate

Active Publication Date: 2014-06-25
ECONOMIC CROPS RES INST OF SHANXI ACAD OF AGRI SCI
View PDF4 Cites 7 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The invention overcomes the deficiencies in the prior art and provides a method for interplanting sesame and scutellaria baicalensis. The method uses the interplanting of sesame and scutellaria baicalensis to solve the problem of no or very low income in the previous crop of scutellaria baicalensis, and the sesame makes full use of scutellaria baicalensis The space before sowing also provides shade for Scutellaria baicalensis, which constitutes a new development model of ecological agriculture, and achieves a double harvest of sesame and Scutellaria baicalensis, greatly improving the input-output ratio per unit plot, improving economic benefits, and improving The planting benefits of Scutellaria baicalensis and the utilization rate of land

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0020] A kind of interplanting method of sesame and Scutellaria baicalensis of the present invention is implemented according to the following technical steps:

[0021] The first step: choose dry land for sowing, the black sesame variety is Jinzhi No. 3;

[0022] Step 2: Fertilize the site to make the moisture level and soil fine, and cover with 80cm wide plastic film to prepare for sowing sesame, and the distance between the two plastic films is 80cm;

[0023] Step 3: When the temperature is stable at 15°C on April 30, the mulch is covered with sesame seeds;

[0024] Step 4: Sesame is planted on both sides of a piece of plastic film, with a row spacing of 60cm and a plant spacing of 19cm, forming wide and narrow row planting;

[0025] Step 5: Remove the plastic film on July 25, and sow Scutellaria baicalensis if there is 3.5cm of rainfall on July 28;

[0026] Step 6: Plant a row of Scutellaria baicalensis between every two rows of sesame seeds, sowing the seeds of scutellar...

Embodiment 2

[0030] A kind of interplanting method of sesame and Scutellaria baicalensis of the present invention is implemented according to the following technical steps:

[0031] The first step: choose water to sow, the white sesame variety is Fenzhi No. 2;

[0032] Step 2: Fertilize the site to make the moisture level and soil fine, and cover with 80cm wide plastic film to prepare for sowing sesame, and the distance between the two plastic films is 80cm;

[0033] Step 3: When the temperature is stable at 16°C on May 5th, mulch and sow sesame seeds;

[0034] Step 4: Sesame is planted on both sides of a piece of plastic film, with a row spacing of 70cm and a plant spacing of 17cm, forming wide and narrow row planting;

[0035] Step 5: Remove the mulch on July 28, and if it rains 4.5cm on July 31, sow Scutellaria baicalensis;

[0036] Step 6: Plant a row of Scutellaria baicalensis between every two rows of sesame seeds, sowing the seeds of scutellaria baicalensis so that the rows of scu...

Embodiment 3

[0040] A kind of interplanting method of sesame and Scutellaria baicalensis of the present invention is implemented according to the following technical steps:

[0041] The first step: choose dry land for sowing, and the white sesame variety is Jinzhi No. 2;

[0042] Step 2: Fertilize the site to make the moisture level and soil fine, and cover with 80cm wide plastic film to prepare for sowing sesame, and the distance between the two plastic films is 80cm;

[0043] Step 3: On April 27, when the temperature was stable at 15°C, mulch and sow sesame seeds;

[0044] Step 4: Sesame is planted on both sides of a piece of plastic film, with a row spacing of 70cm and a plant spacing of 18cm, forming wide and narrow row planting;

[0045] Step 5: Remove the mulch film on July 28, 5.0cm rainfall on July 29, and sow Scutellaria baicalensis;

[0046] Step 6: Plant a row of Scutellaria baicalensis between every two rows of sesame seeds, sowing the seeds of scutellaria baicalensis so that...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to a crop planting method, in particular to a sesame and radix scutellariae interplanting method. By means of the sesame and radix scutellariae interplanting method, interplanting of sesame and radix scutellariae is utilized, the problem that no income or few income is gained from radix scutellariae previous crops is solved, space remaining before radix scutellariae sowing is fully utilized by the sesame, radix scutellariae is shaded, a new development mode of the ecological agriculture is formed, dual-harvest of sesame and radix scutellariae is achieved, the input-out ratio of unit plot is greatly increased, economic benefits are improved, and the radix scutellariae planting benefits and the land utilization ratio are improved. According to the technical scheme, proper land and sesame varieties are selected, the space remaining before radix scutellariae sowing is utilized, the sesame is planted and is mature and cut after the fast growth period of the radix scutellariae comes, growth space is provided for the radix scutellariae, and mutual influence does not exist. The sesame and radix scutellariae interplanting method is easy to implement, obvious in benefit and suitable for popularization.

Description

technical field [0001] The invention relates to a method for planting crops, in particular to a method for interplanting sesame with scutellaria baicalensis. Background technique [0002] For a long time, Scutellaria baicalensis planting in our country is generally monocultured on large tracts of land, and the emergence rate is poor, which seriously affects the yield; Mung beans are labor-intensive and time-consuming, and the previous crop of mung beans has very little yield, almost no income, low land utilization rate, and poor economic income. [0003] Sesame is one of the six major oil crops in my country. It has high economic value. The market price is 5-6 times that of corn. It has the characteristics of short growth period, drought resistance, and barrenness. sowing. Contents of the invention [0004] The invention overcomes the deficiencies in the prior art and provides a method for interplanting sesame and scutellaria baicalensis. The method uses the interplanting...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): A01G1/00
Inventor 刘文萍任果香文飞吕伟
Owner ECONOMIC CROPS RES INST OF SHANXI ACAD OF AGRI SCI
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com