A dual-stage injection amplification device based on a high-power gas flow chemical laser system

A chemical laser and amplification device technology, applied in the direction of laser devices, lasers, laser components, etc., can solve the problems of blazed grating damage and imperfections, and achieve the effects of reducing power density, avoiding damage, and simple line selection methods

Active Publication Date: 2017-02-08
DALIAN INST OF CHEM PHYSICS CHINESE ACAD OF SCI
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Problems solved by technology

However, for high-power gas flow chemical lasers, especially for lasers that operate continuously for a long time, the high power density in the cavity will still cause fatal damage to the blazed grating, so the method of directly selecting the line of the blazed grating to achieve high-power chemical laser output not ideal

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  • A dual-stage injection amplification device based on a high-power gas flow chemical laser system

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Embodiment Construction

[0023] The following non-limiting examples can enable those skilled in the art to understand the present invention more fully, but do not limit the present invention in any way.

[0024] As shown in the accompanying drawings, the present invention is based on a dual-stage injection amplification device of a high-power gas flow chemical laser, and its structure includes a seed laser, a primary injection amplifier and a secondary injection amplifier; the light output in the seed laser passes through a plane total reflection mirror Ⅰ7 and planar total reflection mirror Ⅱ8 are reflected into the primary injection amplifier, and the light amplified by the primary injection amplifier is output to the beam reducer through the planar total reflection mirror Ⅳ19, and the reduced beam enters the secondary injection amplifier and the amplified light output;

[0025] The primary injection amplifier includes a plano-concave mirror II9, and the center of the plano-concave mirror II9 is ​​pr...

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Abstract

The invention relates to a dual-stage injection amplification device based on a high-power gas flow chemical laser system. The device includes a seed laser, a primary injection amplifier and a secondary injection amplifier. The seed laser is injected into the primary laser amplifier for amplification and then injected into the secondary amplifier. Structure for amplified output. Among them, the seed laser is a single-mode line-selected chemical laser, the primary injection amplifier adopts an "8" ring cavity structure, and the secondary injection amplifier adopts a rectangular cavity structure to realize the amplified output of the line-selected gas flow chemical laser. The invention can realize high-power, single-mode, and linearly polarized output of line-selected chemical lasers, and can be widely used in the fields of laser physics, laser chemistry, and the like.

Description

technical field [0001] The invention belongs to the field of chemical laser devices, and in particular relates to a two-stage injection amplification device based on a high-power gas flow chemical laser system. Background technique [0002] Chemical laser is a laser obtained by directly generating excited state particles through chemical reactions. It has many unmatched characteristics of other lasers: it directly converts the chemical energy of chemical reactions into other energies without external energy sources; the laser spectrum is rich and the wavelength covers Near-infrared and mid-infrared ranges have good atmospheric transmission characteristics; high output power and energy conversion efficiency; good engineering scalability, etc. Therefore, since their inception, chemical lasers have been widely used in industry, scientific research, medical and other fields developed rapidly. Pneumatic chemical lasers working in the mid-infrared wavelength range, such as HF / DF,...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01S3/23H01S3/086H01S3/081
Inventor 王元虎多丽萍金玉奇唐书凯于海军汪健曹靖康元福
Owner DALIAN INST OF CHEM PHYSICS CHINESE ACAD OF SCI
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