Facial mask with acne and acne mark removal effect

A facial mask, technology in parts by weight, applied in the direction of skin care preparations, cosmetics, skin diseases, etc., can solve problems such as large pores, ineffective effects, irritation of skin affected areas, etc., to clean pores, remove blackheads, and avoid discomfort Sensitive effect

Inactive Publication Date: 2015-09-23
QINGDAO TOPLINK INFORMATION TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Acne, acne, and acne are the troubles of many young people who love beauty. They not only affect the appearance, but also bring people discomfort. big trouble
However, the cosmetics for removing acne and printing on the market are not only ineffective, but also have certain irritation to the affected skin, so they cannot meet the needs of consumers.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0008] A facial mask with the effect of removing acne and removing marks, which is made of the following raw materials in parts by weight:

[0009] 3 parts of ginseng extract, 4 parts of aloe essence, 6 parts of white peony extract, 4 parts of pearl powder, 5 parts of humectant, 0.01 part of pH regulator, 4 parts of paraffin oil, 30 parts of distilled water, 3 parts of bamboo charcoal powder, angelica 2 parts of powder, 20 parts of tea juice, 0.4 part of methyl glucoside sesquistearate, 1.5 parts of stearic acid, 2 parts of isopropyl palmitate, 0.5 part of propylparaben.

Embodiment 2

[0011] A facial mask with the effect of removing acne and removing marks, which is made of the following raw materials in parts by weight:

[0012] 6 parts of ginseng extract, 12 parts of aloe essence, 9 parts of white peony extract, 10 parts of pearl powder, 8 parts of humectant, 0.04 part of pH regulator, 5 parts of paraffin oil, 50 parts of distilled water, 7 parts of bamboo charcoal powder, angelica 6 parts of powder, 35 parts of tea juice, 1.2 parts of methyl glucoside sesquistearate, 2.5 parts of stearic acid, 5 parts of isopropyl palmitate, and 0.8 part of propylparaben.

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PUM

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Abstract

A facial mask with acne and acne mark removal effect comprises, by weight, 3-6 parts of ginseng extract, 4-12 parts of aloe essence, 6-9 parts of radix paeoniae alba, 4-10 parts of pearl essence, 5-8 parts of humectant, 0.01-0.04 part of pH modifier, 4-5 parts of paroline, 30-50 parts of distilled water, 3-7 parts of bamboo charcoal powder, 2-6 parts of angelica sinensis, 20-35 parts of teawater, 0.4-1.2 parts of GLUCATE SS, 1.5-2.5 parts of stearic acid, 2-5 parts of isopropyl palmitate and 0.5-0.8 parts of propylparaben. The facial mask with the acne and acne mark removal effect has the advantages that the facial mask has acne and acne mark removal function, is capable of effectively cleaning pores and removing black-head pimples and capable of cleaning skin while avoiding discomfort of acne skin and is thereby applicable to users with acne skin.

Description

technical field [0001] The invention relates to a facial mask with the effect of removing acne and scars. Background technique [0002] According to the statistics of scholars, 95% of males and 85% of females suffer from different degrees of acne during adolescence, so it is very appropriate for everyone to call it "acne". Acne, acne, and acne are the troubles of many young people who love beauty. They not only affect the appearance, but also bring people discomfort. Big trouble. However, the cosmetics for removing acne and marks on the market are not only ineffective, but also have certain irritation to the affected part of the skin, so they cannot meet the needs of consumers. Contents of the invention [0003] In view of the deficiencies in the prior art, the problem to be solved by the present invention is to provide a facial mask with the effect of removing acne and printing, which has a good effect of removing acne and printing, effectively cleans pores, removes bla...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): A61K8/98A61K8/97A61Q19/00A61P17/10
Inventor 高珍
Owner QINGDAO TOPLINK INFORMATION TECH
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