An interferometric system imaging distortion calibration device

A calibration device and distortion calibration technology, applied in the direction of measuring devices, optical devices, instruments, etc., can solve the problems of damage, inapplicability of in-situ imaging distortion calibration, etc., and achieve the effect of reducing complexity, compact structure and weight

Inactive Publication Date: 2018-08-07
CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
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Problems solved by technology

However, this method needs to process or deposit grid-type marking points on the surface of the tested optical component, which may damage the surface of the tested optical component, so it is not suitable for in-situ imaging distortion calibration of the high-precision tested optical component

Method used

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  • An interferometric system imaging distortion calibration device
  • An interferometric system imaging distortion calibration device
  • An interferometric system imaging distortion calibration device

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Embodiment Construction

[0018] The present invention will be further described in detail below in conjunction with the accompanying drawings and specific embodiments.

[0019] Such as Figure 1~Figure 4 As shown, a kind of interferometric system imaging distortion calibration device, which is a spherical crown, on the calibration device along the horizontal and vertical distribution with a number of through holes 11, the center of each through hole 11 and each adjacent The center distances of the through holes 11 are the same, the center line of each through hole 11 passes through the center of the sphere where the calibration device is located, and one of the through holes 11 is located at the center of the calibration device, which is the central through hole 13 .

[0020] The through hole 11 is an inverted tapered hole.

[0021] The lower surface 12 of the calibration device has the same shape as the upper surface of the tested optical element 2 .

[0022] The specific working process of this e...

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Abstract

An imaging distortion calibration device of an interferometric measurement system belongs to the technical field of optical element surface shape interferometry, and relates to an imaging distortion calibration device of an interferometric measurement system. The invention can realize the non-contact and non-damage in-situ detection of high-precision optical elements under test under the premise of unknown optical design parameters of the interferometric system, and obtain the imaging distortion of the interferometric system, and has a compact structure, reduces weight and saves space, reducing the accumulation of errors and reducing the complexity of operations. The calibration device is in the shape of a spherical crown, and there are several through holes distributed along the horizontal and vertical directions on the calibration device. The center of each through hole is the same as the center distance of each adjacent through hole. Each through hole The center lines of all pass through the center of the spherical surface where the calibration device is located, and one of the through holes is located at the center of the calibration device, which is the central through hole.

Description

technical field [0001] The invention belongs to the technical field of surface shape interference measurement of optical elements, and relates to an imaging distortion calibration device of an interference measurement system. Background technique [0002] The interferometer is currently the most commonly used instrument in the surface shape detection technology of optical components. The interferometer can be used with different etalons to detect the surface shape errors of optical components with different numerical apertures. Calibrate the error of the interferometric system composed of interferometer and etalon. The imaging distortion of the interferometric system is an important source of error. The surface error detection results containing imaging distortion will introduce coordinates in the process of guiding the surface shape of optical components. Mapping errors, thereby reducing the surface processing accuracy of optical components. [0003] In the prior art, ther...

Claims

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Application Information

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Patent Type & AuthorityPatents(China)
IPC IPC(8): G01B9/02
CPCG01B9/02072
Inventor张文龙苗亮刘钰王辉周烽郭本银马冬梅金春水
OwnerCHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI