Plasma oxidation furnace preheating device and plasma oxidation furnace preheating method
A plasma and oxidation furnace technology, applied in the direction of titanium oxide/hydroxide, titanium dioxide, etc., to avoid local high temperature, avoid cracking, and reduce the effect of rising fluctuations
Inactive Publication Date: 2017-08-11
PANGANG GROUP RESEARCH INSTITUTE CO LTD
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Problems solved by technology
Therefore, there is no plasma preheating oxidation furnace device and plasma preheating furnace in the prior art that can effectively slow down the temperature rise of the oxidation furnace during the preheating period, effectively avoid cracks in the ceramic material lining the furnace, and make the oxidation furnace smoothly transition to a normal operating state. Thermal Oxidation Furnace Method
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[0037] The oxygen purity in the oxygen buffer tank is >99.99%, the oxygen flow rate entering the plasma heater 2 is adjusted to 3kg / h, and the room temperature oxygen flow rate directly entering the mixer 3 is 30kg / h. Turn on the plasma heater 2, set the temperature to 1800°C, keep the total amount of oxygen entering the mixer 3 unchanged, adjust the ratio of high-temperature oxygen to normal temperature oxygen at an interval of 2 hours, and monitor the outlet temperature of the mixer 3 online, the results are as follows figure 2 shown.
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The invention discloses a plasma oxidation furnace preheating device and a plasma oxidation furnace preheating method, and particularly relates to a plasma oxidation furnace preheating device and a plasma oxidation furnace preheating method in the field of oxidation furnace preheating. The plasma oxidation furnace preheating device comprises an oxygen storage device, a plasma heater, a mixer, a reaction area, a normal-temperature oxygen pipeline and a high-temperature oxygen pipeline. The plasma oxidation furnace preheating method includes the steps: A, heating the oxygen flowing through the high-temperature oxygen pipeline to form high-temperature oxygen; B, mixing the high-temperature oxygen and the normal-temperature oxygen; C, conveying the mixed oxygen to the reaction area to chemically react with titanium tetrachloride gas. According to the device, local-high-temperature in an oxidation furnace can be effectively avoided, the rising fluctuation range of the lining temperature of the oxidation furnace is reduced, cracking of ceramic materials caused by quickly heating is avoided, and the oxidation furnace is protected, so that the oxidation furnace can smoothly transits to a normal operating state.
Description
technical field [0001] The invention relates to a plasma preheating oxidation furnace device and a plasma preheating oxidation furnace method, in particular to a plasma preheating oxidation furnace device and a plasma preheating oxidation furnace method in the field of oxidation furnace preheating. Background technique [0002] With the research and application of the production technology of titanium dioxide prepared by the chloride method, the development of a series of key equipment and processes for titanium dioxide chloride has gradually been put on the agenda. [0003] The oxidation section is one of the core processes with the highest technical content and equipment requirements in the whole line. The lining of the oxidation furnace is mostly made of high-temperature refractory ceramics. Usually, the oxygen is preheated to 1600°C by toluene combustion heating. However, oxygen and When toluene burns, there will be a local high temperature region exceeding 2000°C, which...
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Login to View More IPC IPC(8): C01G23/07
CPCC01G23/07
Inventor 李冬勤周艾然杜明陆平
Owner PANGANG GROUP RESEARCH INSTITUTE CO LTD