Conductive substrate

A technology for conductive substrates and transparent substrates, applied to conductive layers on insulating carriers, electrical digital data processing, electrolytic inorganic material coatings, etc., can solve uneven etching, inability to etch metal layers and blackened layers, and size deviation And other issues

Active Publication Date: 2018-09-04
SUMITOMO METAL MINING CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Therefore, if the metal layer and the blackened layer are etched at the same time, sometimes one layer cannot be etched into the target shape, or the etching in the plane is not uniform, resulting in dimensional deviations, resulting in the inability to etch the metal layer and the blackened layer. The problem of simultaneous etching of the chemical layer

Method used

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  • Conductive substrate
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Examples

Experimental program
Comparison scheme
Effect test

experiment example 1

[0183] made with Figure 1A Conductive substrate of the structure shown.

[0184] (Metal layer formation process)

[0185] A copper layer as a metal layer was formed on one surface of a long transparent substrate made of polyethylene terephthalate resin (PET) with a length of 300 m, a width of 250 mm, and a thickness of 100 μm. In addition, the total light transmittance was evaluated by the method specified in JIS K 7361-1 with respect to a transparent substrate made of polyethylene terephthalate resin as a transparent substrate, and the result was 97%.

[0186] In the metal layer forming step, a metal thin film layer forming step and a metal plating layer forming step are performed.

[0187] First, the metal thin film layer forming step will be described.

[0188] In the metal thin film layer forming step, the above-mentioned transparent base material was used as a base material, and a copper thin film layer was formed as a metal thin film layer on one surface of the transp...

experiment example 2- experiment example 10

[0204] In each experimental example, the change points of the current density and the coating time of the nickel ion concentration in the blackening plating solution when forming the blackening layer, the copper ion concentration, the blackening layer and the plating time are as shown in table 1, and other according to Under the same conditions as in Experimental Example 1, a conductive substrate was fabricated and evaluated. The results are shown in Table 1.

[0205] 【Table 1】

[0206]

[0207] From the results shown in Table 1, it was confirmed that in Experimental Example 1 to Experimental Example 10, the blackened layer contained simple nickel, nickel oxide, nickel hydroxide, and copper.

[0208] In addition, the evaluation results of the etching characteristics were "0" or "Δ", and it was confirmed that these conductive substrates have a metal layer and a blackened layer that can be etched simultaneously.

[0209] In particular, in Experimental Examples 1-8, in which...

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Abstract

Provided is a conductive substrate which has a transparent substrate, a metal layer formed on at least one surface of the transparent substrate, and a blackened layer formed on the metal layer, wherein the blackened layer contains elemental nickel, nickel oxide, nickel hydroxide, and copper.

Description

technical field [0001] The invention relates to a conductive substrate. Background technique [0002] The electrostatic capacitive touch panel converts the position information of the approaching object on the panel surface into an electrical signal by detecting the change of the electrostatic capacitance caused when the object approaches the panel surface. The conductive substrate used in the capacitive touch panel is disposed on the surface of the display, so the material of the conductive layer of the conductive substrate is required to have low reflectivity and be difficult to identify. [0003] Therefore, as a material for the conductive layer of the conductive substrate for a touch panel, a material with low reflectance and difficult to see is used, and is formed on a transparent substrate or a transparent film. [0004] For example, Patent Document 1 discloses a conventional transparent conductive film for touch panels in which an ITO (indium oxide-tin) film as a tra...

Claims

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Application Information

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IPC IPC(8): B32B15/08B32B7/02H01B5/14
CPCB32B15/08H01B5/14C23C14/185C23C28/021C23C28/023C25D3/562C25D9/04G06F3/041
Inventor下地匠志贺大树
OwnerSUMITOMO METAL MINING CO LTD