Focusing reflector integral sphere uniform light source

A uniform light source and integrating sphere technology, applied in the direction of optical instrument testing, measuring devices, instruments, etc., can solve the problems that it is difficult to achieve multi-color light allocation and mixing, and the focusing effect of the incident light of the integrating sphere light source is not very ideal, so as to achieve good reflection effect , Design efficient, improve the effect of accuracy

Pending Publication Date: 2019-05-10
GUIZHOU UNIV
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  • Abstract
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  • Claims
  • Application Information

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Problems solved by technology

[0005] The technical problem to be solved by the present invention is to provide a uniform light source with a focusing mirror integrating sphere, so as to solve the technical problems such as the unsatisfactory focusing effect of the incident light of the integrating sphere light source in the prior art, and the difficulty in realizing the deployment and mixing of polychromatic light.

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  • Focusing reflector integral sphere uniform light source

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Embodiment Construction

[0023] A focusing reflector integrating sphere uniform light source, which comprises: integrating sphere cavity 1, the inside of integrating sphere cavity 1 is provided with shielding screen 4, the upper surface of integrating sphere cavity 1 is provided with more than one non-uniform light entrance 5, each non-uniform light The non-uniform light source 3 and the semi-ellipsoidal focusing mirror 2 are equidistantly placed above the uniform light entrance 5, and the non-uniform light source 3 is located below the semi-ellipsoidal focusing mirror 2; the bottom of the integrating sphere cavity 1 has a uniform light source exit port 6. The light exit port 6 of the uniform light source is pasted with an exit light test plane 7.

[0024] The integrating sphere cavity 1 and the shielding screen 4 are uniformly coated with a diffuse reflection coating, and the reflectivity is 98%.

[0025] The spraying process of the diffuse reflection coating must strictly follow the spraying require...

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Abstract

The invention discloses a focusing reflector integral sphere uniform light source. The focusing reflector integral sphere uniform light source comprises an integral sphere cavity (1); a shading screen(4) is arranged in the integral sphere cavity (1); the focusing reflector integral sphere uniform light source is characterized in that more than one non-uniform light inlets (5) are formed in the upper surface of the integral sphere cavity (1); a non-uniform light source (3) and a hemi-ellipsoidal spherical focusing reflector (2) are placed over each non-uniform light inlet (5) in equal distance; the non-uniform light source (3) is positioned below the hemi-ellipsoidal spherical focusing reflector (2); a uniform light source light outlet (6) is formed at the bottom of the integral sphere cavity (1); and an exit light test plane (7) is attached onto the uniform light source light outlet (6). The problems that the integral sphere light source in the prior art cannot autonomously modulate mixed light, the incident light focusing effect is not good due to external arrangement of the light source and the like can be solved.

Description

technical field [0001] The invention belongs to the technical field of light irradiation uniformity measurement, in particular to a uniform light source with a focusing mirror integrating sphere. Background technique: [0002] Integrating sphere is a spherical cavity whose inner surface is evenly coated with diffuse reflection material. It is used to collect the mixed and uniform light after reflection or scattering of test light at each opening on the surface of the spherical shell. It is also often called a light flux sphere. The uniform light source collected by the integrating sphere is often used as a scattered light source or used to measure optical parameters of illuminants, such as reflection coefficient, spectral power, etc., and can also be used to measure lasers and LEDs. [0003] The integrating sphere light source can be used as a reference source for calibrating various optical remote sensing radiation instruments, and has important reference value in the devel...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01M11/00
Inventor 杨晨曾瑞敏
Owner GUIZHOU UNIV
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