A Continuously Adjustable Uniform Illumination System with Illumination Area

A uniform lighting and area technology, applied in the direction of lighting devices, lighting and heating equipment, parts of lighting devices, etc., can solve problems such as complex structures, achieve simple movement, simple adjustment of spot size, and realize adjustment of spot size Effect

Active Publication Date: 2021-03-23
安徽国芯智能装备有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] However, the prior art can only be applied to the field of general lighting, and the adjustment of the lighting area is realized by adjusting the rotation angle of the first rotating mechanism and the second rotating mechanism, and the structure is relatively complicated.

Method used

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  • A Continuously Adjustable Uniform Illumination System with Illumination Area
  • A Continuously Adjustable Uniform Illumination System with Illumination Area
  • A Continuously Adjustable Uniform Illumination System with Illumination Area

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0034] Table 1 is a summary table of parameters of each lens provided in Embodiment 1 of the present invention, as shown in Table 1:

[0035]

[0036] It should be noted that S1 is the light exit surface of the light rod, S2 is the light entrance surface of the first lens, S3 is the light exit surface of the first lens; S4 is the light entrance surface of the second lens, and S5 is the light exit surface of the second lens ; S6 is the light incident surface of the third lens, S7 is the light exit surface of the third lens; S8 is the light incident surface of the fourth lens, S9 is the light exit surface of the fourth lens; S10 is the light incident surface of the fifth lens, S11 is the light exit surface of the fifth lens; S12 is the light incident surface of the sixth lens, and S13 is the light exit surface of the sixth lens.

[0037] figure 2 A schematic diagram of the test results of the illumination spot provided by Example 1 of the present invention, figure 2 as sh...

Embodiment 2

[0039] Table 2 is a summary table of parameters of each lens provided in Embodiment 1 of the present invention, as shown in Table 2:

[0040]

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PUM

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Abstract

The invention provides uniform illumination system with continuously adjustable illumination area. The system comprises a laser light source, a light spot adjusting lens group and a converging lens group which are sequentially arranged along an optical axis; the light spot adjusting lens group comprises a first lens and a second lens which are sequentially arranged, and the light incident surfaceof the first lens faces the laser light source; the light-emitting surface of the first lens is far away from the laser light source; the incident surface of the second lens faces the emergent surfaceof the first lens; the light emitting surface of the second lens is arranged towards the light incident surface of the light spot adjusting lens group; the light-emitting surface of the second lens is arranged towards the converging lens group; the second lens moves along the optical axis direction; the converging lens group comprises a third lens, a fourth lens and a fifth lens which are connected in series, the light incident surface of the third lens faces the light emergent surface of the second lens, the light emergent surface of the third lens faces the light incident surface of the fourth lens, and the light emergent surface of the fourth lens faces the light incident surface of the fifth lens. By applying the embodiment of the invention, the structure is simpler.

Description

technical field [0001] The invention relates to the technical field of laser lithography, in particular to a continuously adjustable and uniform illumination system with an illumination area. Background technique [0002] With the development of modern PCB board technology, lithography technology has been widely used more and more. With the higher and higher requirements for production capacity of PCB exposure machines, the requirements for the utilization rate of light sources are also higher and higher. In traditional lighting systems, the lighting area is usually fixed. This lighting area needs to match the receiver. A slightly larger lighting area will reduce energy utilization, and a smaller lighting area will cause poor uniformity or image loss. . So how to strike a balance between uniformity and energy utilization is very critical. Furthermore, how to obtain an illumination area, that is, an illumination system with continuously adjustable spot size, is a technical ...

Claims

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Application Information

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Patent Type & AuthorityPatents(China)
IPC IPC(8): G03F7/20F21V14/06
CPCF21V14/06G03F7/2008G03F7/70025
Inventor李文静薛业保章广飞王运钢
Owner安徽国芯智能装备有限公司