Circuit board production equipment based on vacuum etching technology

Abstract

The invention relates to the field of etching technology, and discloses circuit board production equipment based on vacuum etching technology, including a base, a clamping plate, an etching cylinder, a rotating motor, a turntable, a vacuum device, and an etching device. The bottom surface of the etching cylinder is in a hollow state, and the clamping plate It is an inverted L-shaped body, and the number of clamps is two, which are opposite to each other. The sides of the two clamps are curved and fit with the inner wall of the etching cylinder. Both the vacuum device and the etching device are set on the etching cylinder. , through the setting of the vacuum device, the continuous suction effect is used to form a vacuum effect in all the bases, so as to perform a strong extraction effect on the dust in the base, thereby removing the dust in the base or the circuit board before etching, and etching The smoke and impurities produced by the chemical reaction in the process can increase the cleanliness of the circuit board after etching, and avoid the problem of dust and other smoke and impurities participating in the etching process and resulting in a decrease in the quality of the circuit board. Compared with the cleaning mechanism on the existing etching machine , the cleaning range is more comprehensive and stronger.

Description

technical field [0001] The invention relates to the technical field of etching, in particular to circuit board production equipment based on vacuum etching technology. Background technique [0002] Existing etching machines for circuit boards mostly use the method of spraying chemical solutions to etch the exposed metal parts, so as to obtain the required geometric patterns and high-precision dimensions. [0003] The existing patent No. CN102092955A proposes an etching device, which has the advantage of reducing the occurrence of etching defects, but it lacks the effect of effectively cleaning the etching environment and impurities on the circuit board and effectively recovering the etching solution before and during etching. This leads to the reduction of the etching effect of the circuit board and the reduction of the efficiency of the front and rear processing. [0004] The existing patent No. CN103208438A proposes an etching device, which has the advantages of saving co...

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Problems solved by technology

[0003] The existing patent No. CN102092955A proposes an etching device, which has the advantage of reducing the occurrence of etching defects, but it lacks the effect of effectively cleaning the etching environment and impurities on the circuit board and effectively recovering the etching solution before and during etching. The problem that the etching effect of the circuit board is reduced and the efficiency of the front and rear processing is reduced

[0004] The existing patent No. CN103208438A proposes an etching device, which has the advantages of saving costs, shortening the manufacturing process time and increasing production capacity, but it uses various electrical components such as vacuum pumps, pneumatic cylinders and conveying components, so that it has high Equipment cost and power consumption, as well as high equipment volume, and the above conditions make the use conditions of the equipment lead to the problem of high requirements for the use environment

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