An easy-to-disassemble device for preventing backsplash liquid from polluting wafers
A wafer and liquid technology, applied in the field of wafer photoresist curing in the semiconductor industry, can solve the problems of small replacement space and inconvenient operation, and achieve the effect of avoiding tilt and stable lifting movement
Active Publication Date: 2021-11-12
宁波润华全芯微电子设备有限公司
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[0003] Therefore, the embodiment of the present invention provides an easy-to-disassemble device for preventing backsplash liquid from contaminating the wafer, which effectively solves the problem of small replacement space and inconvenient operation when replacing the waste liquid collection rectifier cup
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[0034] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without creative efforts fall within the protection scope of the present invention.
[0035] see Figure 1-2, the embodiment of the present invention provides a device 100 that is easy to disassemble and prevent backsplash liquid from contaminating wafers, including: a waste liquid collection rectifier cup 110 (CUP), a waste liquid collection rectifier cup support 120, at least one lifting active part and at least A translation active part. Wherein, the waste liquid collecting rectifying cup support 120 is located below the waste liquid collecting ...
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The invention discloses an easy-to-disassemble device for preventing backsplash liquid from contaminating wafers. The device for preventing backsplash liquid from contaminating wafers includes: a waste liquid collection rectifier cup; a waste liquid collection rectifier cup support member, and the waste liquid The collecting rectifying cup support is used to support the waste liquid collecting rectifying cup; at least one lifting active part is arranged on either side of the waste liquid collecting rectifying cup, and the lifting active part is used to control the The lifting movement of the waste liquid collection rectifier cup; at least one translation active part, the translation active part is slidingly connected with the lifting active part, and the translation active part is used to control the horizontal movement of the waste liquid collection rectification cup; Wherein, the lifting active part is connected to the support part of the waste liquid collection rectifier cup, or the translation active part is connected to the support part of the waste liquid collection rectification cup. The invention effectively solves the problems of small replacement space and inconvenient operation when replacing the waste liquid collection rectifier cup.
Description
technical field [0001] The invention relates to the field of wafer photoresist curing in the semiconductor industry, in particular to a device that is easy to disassemble and prevent backsplash liquid from polluting the wafer. Background technique [0002] In the coating and developing process of the wafer, it is necessary to spray the developing solution on the wafer. The wafer is placed on the liftable wafer loading device (CHECK) and located in the waste liquid collection rectifier cup (CUP). During the cleaning process, the waste liquid collection rectifier cup can prevent the developer from splashing back and rectifying during rotary spraying. Among them, the rectifying cup for collecting waste liquid needs to be replaced regularly, and since the rectifying cup for collecting waste liquid is located inside the equipment, when replacing it, the replacement space is relatively small and the operation is inconvenient. Contents of the invention [0003] Therefore, embodi...
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IPC IPC(8): G03F7/30H01L21/67
CPCG03F7/3092H01L21/6715
Inventor 刘长伟耿克涛袁创迪刘金
Owner 宁波润华全芯微电子设备有限公司