Multi-path synchronous focusing and leveling system and method for photoetching machine

Abstract

The embodiment of the invention discloses a multi-path synchronous focusing and leveling system and method for a photoetching machine. The system comprises an image acquisition module and a main control module, wherein a plurality of analog signal processing modules in the image acquisition module are electrically connected with the digital signal processing module; the main control module sends an image acquisition instruction to the image acquisition module; the digital signal processing module respectively sends an image acquisition instruction to the plurality of analog signal processing modules according to the same clock signal; the analog signal processing module excites the imaging sensor to acquire image information; and the main control module calculates accurate height data so as to drive the photoetching machine motion table to realize focusing and leveling. According to the invention, the problem of time delay of the existing multi-path image focusing and leveling can be solved, the same clock can be realized from the triggering of the acquisition command to the acquisition and feedback of the imaging sensor, the synchronism and the real-time performance of the image acquisition of the multi-path imaging sensor are improved, and the synchronous configuration of a plurality of focusing and leveling points is ensured.

Description

technical field [0001] Embodiments of the present invention relate to the technical field of lithography machines, and in particular, to a system and method for multi-channel synchronous focusing and leveling of lithography machines. Background technique [0002] A projection lithography machine is a device that projects a mask pattern onto the surface of a silicon wafer through a projection objective lens. During the exposure process of the lithography machine, if the silicon wafer is out of focus or tilted relative to the focal plane of the objective lens, some areas in the exposure field of view will be outside the effective focal depth, which will seriously affect the quality of lithography. Therefore, focus adjustment must be used. Leveling system for precise control. [0003] figure 1 It is the control logic diagram of the existing lithography machine focusing and leveling system, refer to figure 1 , In the common control logic of focusing and leveling, multiple cam...

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