Measuring system and measuring method considering focusing and leveling and precision alignment

A measurement system, focusing and leveling technology, applied in the field of lithography machines, can solve the problems of long production time, high space occupancy rate of lithography machines, and low yield of lithography machines

Active Publication Date: 2020-07-07
INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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Problems solved by technology

[0004] The technical problem to be solved by the present invention is to provide a measurement system and measurement method that takes into account both focus adjustment, leveling and precision alignment, so as to solve the problems caused by the independent vertical and horizontal detection systems in the existing photolithography machines. For the problem of

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  • Measuring system and measuring method considering focusing and leveling and precision alignment
  • Measuring system and measuring method considering focusing and leveling and precision alignment
  • Measuring system and measuring method considering focusing and leveling and precision alignment

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[0024] In order to make the objectives, technical solutions, and device advantages of the present invention clearer, the present invention will be described in further detail below in conjunction with the accompanying drawings.

[0025] Reference figure 1 , The measurement system includes a six-degree-of-freedom nano-motion platform 1; a slide table 2, which is mounted on the six-degree-of-freedom nano-motion platform 1, a silicon wafer to be exposed 3; an exposure mask 4, which is fixed by a mask holding device 6; The substrate 5; the mask holding device 6 fixed to the main substrate 5; the alignment mark 7 on the substrate; the gap measurement mark 8 on the mask; the alignment mark area 9 on the mask; the illumination source lens 10; 1. The second X\Y axis translation stage 100\200; the first and second Tz axis rotation stages 101\201 are installed on the first and second X\Y axis translation stages 100\200; Two tilt adapter plates 102\202, respectively installed on the first a...

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Abstract

The invention discloses a measuring system considering focusing and leveling and precision alignment and a measuring method thereof. The system is characterized in that a dark field moire fringe alignment deviation detection function and a chirped grating gap detection function are integrated into one group of detection units. According to the measurement system considering alignment and focusingleveling, an integrated structure of a vertical measurement system and a horizontal measurement system is realized, the space requirement of a photoetching machine complete machine system is reduced,and the space occupation rate of a photoetching machine is reduced. According to the measuring method of the measuring system considering alignment and focusing leveling, the focusing leveling and alignment of the substrate are achieved, and the working efficiency of a photoetching machine is improved.

Description

technical field [0001] The invention relates to the field of lithography machines, in particular to a measurement system and a measurement method thereof that take into account both focusing, leveling, and precision alignment, and a lithography machine based on the measurement system and the measurement method thereof. Background technique [0002] In the production process of semiconductor chips, in order to achieve the desired accuracy index, it is necessary to accurately establish the relationship between the various coordinate systems of the lithography machine, so that the mask, objective lens, and wafer stage can establish a unified positional relationship. Usually, these devices are equipped with one or more sets of vertical detection systems, which are used to adjust the focus and level the substrate under test before aligning the mask with the substrate. On the one hand, to ensure that the substrate is in the imaging of the mask On the other hand, when the substrate...

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Application Information

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IPC IPC(8): G03F9/00
CPCG03F9/7023G03F9/7088
Inventor 罗先刚刘明刚高平蒲明博马晓亮李雄
Owner INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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