A method of laser surface remelting and chemical dealloying combined to prepare micro-nano structured bulk silicon materials

Abstract

The invention discloses a method for preparing a micro-nano structure bulk silicon material through the laser surface remelting and chemically de-alloying and compounding process. The method is characterized in that, firstly, the surface remelting treatment is conducted on the aluminum-silicon alloy by using the laser; secondly, a surface remelting layer is cut off; finally, the remelting layer is subjected to the de-alloying treatment by using a corrodent to remove the element aluminum. In this way, the micro-nano structure bulk silicon material is finally obtained as shown in figure 1. The method has the advantages of simple operation, short period and high efficiency. The method can be carried out at a normal temperature. The prepared bulk silicon material can be applied to the fields of solar cells, lithium ion cells, biology and the like.

Description

technical field

[0001] The invention belongs to the technical field of material preparation, and relates to a method for preparing a micro-nano structure block silicon material by using an aluminum-silicon alloy as a raw material. Specifically, a laser is used to remelt the surface of an aluminum-silicon alloy, and the aluminum element in the remelted layer is dissolved by chemical dealloying to prepare a micro-nano structured bulk silicon material. Background technique

[0002] Micro-nano silicon materials are widely used in solar cells, biosensors, light-emitting devices, and lithium-ion batteries due to their characteristics of large surface area, good permeability, low thermal conductivity, strong adsorption, and high chemical activity. At present, the preparation methods of micro-nano silicon materials mainly include: (1) CVD deposition method, which usually uses silane as a raw material to prepare micro-nano silicon materials by vapor phase deposition. This method has ...

Examples

Embodiment 1

[0025] 1. Raw materials:

[0026] (1) Aluminum-silicon block alloy, Al:Si=95:5wt.%.

[0027] (2) Etching solution: 3mol / L HCL solution.

[0028] 2. Preparation method

[0029] Step 1. Preparation of precursor alloy material:

[0030] YLS-6000 fiber laser is used for remelting treatment, laser power: 4kW, scanning speed: 8mm / s, spot diameter: 6mm, shielding gas: argon, shielding gas flow: 18L / min. After laser treatment, wire cutting is used to separate the remelted layer from the substrate to obtain the precursor alloy material.

[0031] Step 2, chemical dealloying treatment:

[0032] Immerse the precursor alloy material obtained by the remelting treatment into a 3mol / L HCL solution and corrode for 2 hours until no bubbles are generated and the aluminum is completely dissolved. Clean the micro-nano structure intermediate obtained after corrosion with an ethanol solution, and then use The HF with a mass percentage of 2% is used for cleaning, and finally a silicon material w...

Embodiment 2

[0034] 1. Raw materials:

[0035] (1) Aluminum-silicon block alloy, Al:Si=80:20wt.%.

[0036] (2) Etching solution: 3mol / L HCL solution.

[0037] 2. Preparation method

[0038] Step 1. Preparation of precursor alloy material:

[0039] Using YLS-6000 fiber laser for remelting treatment, laser power: 5.5kW, scanning speed: 10mm / s, spot diameter: 6mm, shielding gas: argon, shielding gas flow: 18L / min. After laser treatment, wire cutting is used to separate the remelted layer from the substrate to obtain the precursor alloy material.

[0040] Step 2, chemical dealloying treatment:

[0041] Immerse the precursor alloy material obtained by the remelting treatment into a 3mol / L HCL solution and corrode for 8 hours until no bubbles are generated and the aluminum is completely dissolved. Clean the micro-nano structure intermediate obtained after corrosion with an ethanol solution, and then use The HF with a mass percentage of 2% is used for cleaning, and finally a bulk silicon mat...

Embodiment 3

[0043] 1. Raw materials:

[0044] (1) Aluminum-silicon block alloy, Al:Si=50:50wt.%.

[0045] (2) Etching solution: 3mol / L HCL solution.

[0046] 2. Preparation method

[0047] Step 1. Preparation of precursor alloy material:

[0048] Using YLS-6000 fiber laser for remelting treatment, laser power: 5.5kW, scanning speed: 10mm / s, spot diameter: 6mm, shielding gas: argon, shielding gas flow: 18L / min. After laser treatment, wire cutting is used to separate the remelted layer from the substrate to obtain the precursor alloy material.

[0049] Step 2, chemical dealloying treatment:

[0050] Immerse the precursor alloy material obtained by the remelting treatment in a 3mol / L HCL solution and corrode for 12 hours until no bubbles are generated and the aluminum is completely dissolved. Clean the micro-nano structure intermediate obtained after corrosion with an ethanol solution, and then use The HF with a mass percentage of 2% is used for cleaning, and finally a bulk silicon mate...

technical field

[0001] The invention belongs to the technical field of material preparation, and relates to a method for preparing a micro-nano structure block silicon material by using an aluminum-silicon alloy as a raw material. Specifically, a laser is used to remelt the surface of an aluminum-silicon alloy, and the aluminum element in the remelted layer is dissolved by chemical dealloying to prepare a micro-nano structured bulk silicon material. Background technique

[0002] Micro-nano silicon materials are widely used in solar cells, biosensors, light-emitting devices, and lithium-ion batteries due to their characteristics of large surface area, good permeability, low thermal conductivity, strong adsorption, and high chemical activity. At present, the preparation methods of micro-nano silicon materials mainly include: (1) CVD deposition method, which usually uses silane as a raw material to prepare micro-nano silicon materials by vapor phase deposition. This method has ...

Examples

Embodiment 1

[0025] 1. Raw materials:

[0026] (1) Aluminum-silicon block alloy, Al:Si=95:5wt.%.

[0027] (2) Etching solution: 3mol / L HCL solution.

[0028] 2. Preparation method

[0029] Step 1. Preparation of precursor alloy material:

[0030] YLS-6000 fiber laser is used for remelting treatment, laser power: 4kW, scanning speed: 8mm / s, spot diameter: 6mm, shielding gas: argon, shielding gas flow: 18L / min. After laser treatment, wire cutting is used to separate the remelted layer from the substrate to obtain the precursor alloy material.

[0031] Step 2, chemical dealloying treatment:

[0032] Immerse the precursor alloy material obtained by the remelting treatment into a 3mol / L HCL solution and corrode for 2 hours until no bubbles are generated and the aluminum is completely dissolved. Clean the micro-nano structure intermediate obtained after corrosion with an ethanol solution, and then use The HF with a mass percentage of 2% is used for cleaning, and finally a silicon material w...

Embodiment 2

[0034] 1. Raw materials:

[0035] (1) Aluminum-silicon block alloy, Al:Si=80:20wt.%.

[0036] (2) Etching solution: 3mol / L HCL solution.

[0037] 2. Preparation method

[0038] Step 1. Preparation of precursor alloy material:

[0039] Using YLS-6000 fiber laser for remelting treatment, laser power: 5.5kW, scanning speed: 10mm / s, spot diameter: 6mm, shielding gas: argon, shielding gas flow: 18L / min. After laser treatment, wire cutting is used to separate the remelted layer from the substrate to obtain the precursor alloy material.

[0040] Step 2, chemical dealloying treatment:

[0041] Immerse the precursor alloy material obtained by the remelting treatment into a 3mol / L HCL solution and corrode for 8 hours until no bubbles are generated and the aluminum is completely dissolved. Clean the micro-nano structure intermediate obtained after corrosion with an ethanol solution, and then use The HF with a mass percentage of 2% is used for cleaning, and finally a bulk silicon mat...

Embodiment 3

[0043] 1. Raw materials:

[0044] (1) Aluminum-silicon block alloy, Al:Si=50:50wt.%.

[0045] (2) Etching solution: 3mol / L HCL solution.

[0046] 2. Preparation method

[0047] Step 1. Preparation of precursor alloy material:

[0048] Using YLS-6000 fiber laser for remelting treatment, laser power: 5.5kW, scanning speed: 10mm / s, spot diameter: 6mm, shielding gas: argon, shielding gas flow: 18L / min. After laser treatment, wire cutting is used to separate the remelted layer from the substrate to obtain the precursor alloy material.

[0049] Step 2, chemical dealloying treatment:

[0050] Immerse the precursor alloy material obtained by the remelting treatment in a 3mol / L HCL solution and corrode for 12 hours until no bubbles are generated and the aluminum is completely dissolved. Clean the micro-nano structure intermediate obtained after corrosion with an ethanol solution, and then use The HF with a mass percentage of 2% is used for cleaning, and finally a bulk silicon mate...

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