Culture substrate for alpine azalea

A cultivation substrate, rhododendron technology, applied in the field of alpine rhododendron cultivation substrate, can solve the problem of limited supply of finished flowers, achieve the effect of rich humus, good air permeability and water permeability, and reduce application

Active Publication Date: 2010-09-08
云南远益园林工程有限公司
View PDF4 Cites 8 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Rhododendron alpine is very popular in the flower market, but due to the lack of Rhododendron alpine varieties with indep

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Culture substrate for alpine azalea

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a culture substrate for alpine azalea, which comprises mushroom residues, pine straws, crushed crop straws and ericaceous mycorrhizal fungi, and is prepared by the following steps of: 1) preparing a thoroughly decomposed organic matter, namely uniformly stirring the mushroom residues common in Yunnan, the pine straws, the crushed crop straws and the like, stacking the mixture in the open, drenching the mixture by one or two soaking rains or watering, tightly covering a plastic film on the mixture, and stacking the mixture for half a year or more than half a year for thorough decomposition; 2) mixing raw materials of the substrate, namely uniformly mixing the thoroughly decomposed organic matter, vermiculite and peat soil in a volume ratio of 2:2:1; 3) adjusting the pH value, namely after mixing the substrate, adjusting the pH value to be about 5.0 to 6.5 by using 1 percent ferrous sulfate solution; and 4) adding the ericaceous mycorrhizal fungi into a prepared basic substrate.

Description

A kind of alpine rhododendron cultivation substrate technical field The invention relates to alpine rhododendron cultivation techniques, in particular to a cultivation substrate for alpine rhododendron. Background technique Alpine Rhododendron refers to the species of evergreen Rhododendron distributed in high mountains and subalpine areas above 800 meters above sea level. Its leaves are leathery, and its inflorescences are mostly raceme umbels. The leaves are evergreen and shiny, so they are highly ornamental. They can not only be used as high-end potted flowers, but also high-end landscaping materials. Alpine Rhododendron is very popular in the flower market. However, due to the lack of alpine Rhododendron varieties with independent intellectual property rights and mature cultivation techniques in China, the supply of finished flowers is limited. Currently, most of the imported alpine Rhododendrons are sold on the market. Contents of the invention The purpose of the ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): A01G31/00C05G3/00C05F17/00
CPCY02W30/40
Inventor 李奋勇刘国强皮秋霞
Owner 云南远益园林工程有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products