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Actuator having at least one magnet for a projection exposure system, production method therefor and projection exposure system having a magnet

An exposure system and actuator technology, which is applied in the field of projection exposure systems, can solve the problems that the joint cannot reliably absorb mechanical force, the manufacturing cost is high, and the joint is destroyed.

Active Publication Date: 2015-01-21
CARL ZEISS SMT GMBH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

For example, in the case of microtechnologically manufactured actuators with several connection points called bond points, the problem arises that not only the manufacturing effort involved becomes very large, but also that the bond points cannot Reliable absorption of corresponding mechanical forces, especially shear forces
[0005] Furthermore, such junctions may be destroyed when certain light wavelengths are used in projection exposure systems, for example in the extreme ultraviolet wavelength range

Method used

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  • Actuator having at least one magnet for a projection exposure system, production method therefor and projection exposure system having a magnet
  • Actuator having at least one magnet for a projection exposure system, production method therefor and projection exposure system having a magnet
  • Actuator having at least one magnet for a projection exposure system, production method therefor and projection exposure system having a magnet

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Embodiment Construction

[0038] figure 1 A cross-sectional view of a ring magnet 1 is shown, its two parts being shown in view of the cross-section and ring structure. The ring magnet 1 is intended for use in actuators of projection exposure systems for microlithography, in particular projection exposure systems operating in the wavelength range of extreme ultraviolet light. Since the invention is applicable to all known projection exposure systems, the drawing of the projection exposure systems has been omitted for the sake of simplicity.

[0039] The magnet 1 may be, for example, a neodymium-iron-boron or samarium-cobalt magnet.

[0040] Since EUV projection exposure systems operate in a hydrogen environment, damage to magnets, especially rare earth based magnets, can occur through hydrogenation formation. In order to avoid contact with hydrogen, the ring magnet 1 is protected from the gaseous environment by a corresponding ring envelope 2 .

[0041] The annular envelope 2 is composed of two part...

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Abstract

The present disclosure relates to an actuator for projection exposure systems that include a magnet. The magnet is encapsulated and / or supported in a magnet holding plate that is produced by microtechnical production methods so that a moving manipulator surface is held in the magnet holding plate via monolithic or bonded connections without additional connecting material so that there is a secure connection.

Description

technical field [0001] The invention relates to a projection exposure system for microlithography, in particular to a projection exposure apparatus with at least one magnet operating with light of wavelengths in the extreme ultraviolet range (EUV), a system for actuating such An actuator of an optical element in a projection exposure system, and a method for operating a corresponding projection exposure system. Furthermore, a method for manufacturing a corresponding actuator for a projection exposure system is given. Background technique [0002] In projection exposure systems for microlithography, which are used in the manufacture of microtechnology, especially microelectronics and / or micromechanical components. For example, a micromirror array (MMA) can be used, where multiple small mirrors have to be tilted. [0003] Actuation of various components such as optical elements (especially micromirrors) can be performed using actuators based on the principle of electromagne...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20G02B26/08H01F7/02
CPCH01F7/1638G02B27/0006H01F7/0221G03F7/7095G02B26/085H01F7/1623G03F7/70291G02B26/08G03F7/20H01F7/02G03F7/70
Inventor 阿明.沃伯诺伯特.穆埃尔伯格阿尔穆特.恰普于尔根.费希尔
Owner CARL ZEISS SMT GMBH