High-power laser wave front measuring instrument and wave front measuring method

A laser wave and measuring instrument technology, applied in the field of laser technology measurement, can solve problems such as the inapplicability of wavefront analyzers, and achieve the effects of fast detection speed, clear and simple operation, and effective attenuation.

Inactive Publication Date: 2013-06-12
XIDIAN UNIV
View PDF3 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] The technical problem to be solved by the present invention is to provide a high-power laser wavefront measuring instrument and its measuring instrument for the traditional wavefront analyzer which is not suitable for large-diameter laser wavefront and high-power laser wavefront measurement of the 10,000-watt level. method to solve the wavefront analysis of a single laser and the phase difference measurement of any two lasers in the coherent combination of multiple high-power lasers

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • High-power laser wave front measuring instrument and wave front measuring method
  • High-power laser wave front measuring instrument and wave front measuring method
  • High-power laser wave front measuring instrument and wave front measuring method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0028] The measurement principle, system structure and specific working process of the present invention will be described in detail and completely below in conjunction with the accompanying drawings.

[0029] 1, system structure of the present invention and concrete work process are as follows:

[0030] refer to figure 1 , the measuring instrument of the present invention comprises: mechanical shutter 1, beam sampling mirror 2, beam reduction optical system 3, transmission attenuator 4, reflection attenuator 6, Hartmann wavefront analyzer 5, phase difference detection CCD camera 7 and computer 8. The mechanical shutter 1 is only opened during the wavefront measurement, so that the measuring instrument works in a pulse mode, so as to avoid thermal deformation of the optical components of the measurement system caused by high-power laser and affect the measurement accuracy. The beam sampling mirror 2 attenuates the high-power laser for the first time, and reflects the laser b...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a high-power laser wave front measuring instrument and a wave front measuring method, and solves the problems of single-beam laser wave front analysis and phase difference measurement of two arbitrary beams of laser in multi-beam high-power laser coherent combination. The measuring instrument comprises a mechanical shutter, a light beam sampling reflecting mirror, a laser compressing optical system, a transmission-type attenuator, a reflection-type attenuator, a Hartmann wave front analyzer, a phase difference detecting charge coupled device (CCD) camera, and a computer. When the measuring instrument works, the mechanical shutter is opened only during the wave front measurement. The measuring method includes the steps of using the Hartmann wave front analyzer for measuring the wave front of each single-beam laser and simultaneously using the phase difference detecting CCD camera for recording the light distribution of each single-beam laser; taking one single-beam laser as a reference, opening other beams of laser in sequence to interfere with the referential laser respectively; using the phase difference detecting CCD camera for measuring the light intensity of each two beams of laser after the coherent combining so as to obtain phase differences of each beam of laser relative to the referential laser; and using the Hartmann wave front analyzer for measuring the wave front of the laser after the coherent combination.

Description

technical field [0001] The invention belongs to the field of laser technology measurement, and specifically relates to a measurement system for single-path laser wavefront analysis and phase difference measurement of any two-path laser in coherent combination of multi-path high-power lasers. Laser wavefront measurements at the watt level. Background technique [0002] Improving laser wavefront performance is an important means to improve laser beam quality. Therefore, laser wavefront characteristics are not only a technical index of laser performance, but also an evaluation index of beam quality. [0003] For high-power laser devices, the wavefront distortion and atmospheric turbulence effects of the outgoing laser will affect the near-field beam quality, focusing characteristics and laser transmission capabilities. Therefore, suppressing and compensating the mid-to-high frequency phase distortion becomes the key to ensuring the quality of the laser beam, and the laser wave...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Patents(China)
IPC IPC(8): G01J9/00G01J9/02
Inventor 李庆辉曾晓东相里微
Owner XIDIAN UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap