The invention relates to a device and a method for 
wavefront analysis. A device for 
wavefront analysis, which is designed for analyzing the 
wavefront of at least one 
light wave passing through an optical 
system, comprises at least one illumination 
mask (105, 205, 305, 405, 406, 407), at least one first 
grating (120, 220, 320, 420), which has at least one first 
grating structure and generates an interferogram in a predefined plane from a wavefront to be analyzed which proceeds from the illumination 
mask and passes through the optical 
system, at least one second 
grating (130, 230, 330, 430) arranged in said predefined plane, said at least one second grating having at least one second grating structure and generating a 
superimposition pattern by the 
superimposition of the second grating structure with the interferogram generated by the first grating, and at least one 
detector (140, 240, 340, 440) for detecting said 
superimposition pattern.