The invention relates to a device and a method for wavefront analysis. A device for wavefront analysis, which is designed for analyzing the wavefront of at least one light wave passing through an optical system, comprises at least one illumination mask (105, 205, 305, 405, 406, 407), at least one first grating (120, 220, 320, 420), which has at least one first grating structure and generates an interferogram in a predefined plane from a wavefront to be analyzed which proceeds from the illumination mask and passes through the optical system, at least one second grating (130, 230, 330, 430) arranged in said predefined plane, said at least one second grating having at least one second grating structure and generating a superimposition pattern by the superimposition of the second grating structure with the interferogram generated by the first grating, and at least one detector (140, 240, 340, 440) for detecting said superimposition pattern.