The invention relates to a device and a method for
wavefront analysis. A device for
wavefront analysis, which is designed for analyzing the
wavefront of at least one
light wave passing through an optical
system, comprises at least one illumination
mask (105, 205, 305, 405, 406, 407), at least one first
grating (120, 220, 320, 420), which has at least one first
grating structure and generates an interferogram in a predefined plane from a wavefront to be analyzed which proceeds from the illumination
mask and passes through the optical
system, at least one second
grating (130, 230, 330, 430) arranged in said predefined plane, said at least one second grating having at least one second grating structure and generating a
superimposition pattern by the
superimposition of the second grating structure with the interferogram generated by the first grating, and at least one
detector (140, 240, 340, 440) for detecting said
superimposition pattern.