Focusing adjustment leveling mechanism of photolithographic machine and leveling mechanism of photolithographic machine

Abstract

The invention relates to a focusing adjustment leveling mechanism of photolithographic machine, including: a base; piezoelectric ceramic driver assemblies, including fixedly connected piezoelectric ceramic driver and ball head bearings, the number of the piezoelectric ceramic driver assemblies is three, the piezoelectric ceramic driver is fixed on the base, the three piezoelectric ceramic driver assemblies are configured in a manner of right triangle; a load-bearing stage assembly including a load-bearing stage, the load-bearing stage assembly is set with an arc-shaped groove for holding a first ball head bearing, a strip-shaped for holding a second ball head bearing and a plane boss for holding a third ball head bearing; a tension spring assembly connected with the base and the load-bearing stage for realizing force sealing of the load-bearing stage and the base. The invention has specific position under natural placement state; under the action of driving, the invention has specific movement, thus solving the problem of restricting shortage of existing focusing adjustment leveling mechanism. By adopting kinematic structure, the invention eliminates the redundant degree of freedom in vertical direction of three-point support type leveling mechanism, improves rigidity and stability of the mechanism.

Description

【Technical field】 [0001] The invention relates to the field of precision instruments, in particular to a focusing and leveling mechanism of a lithography machine and a leveling mechanism of a lithography machine. 【Background technique】 [0002] Lithography machine is the core driving force to promote the development of integrated circuits, and the development of integrated circuits puts forward higher and higher requirements for the resolution of lithography machines. However, with the improvement of the resolution of the lithography machine, the focal depth of the objective lens of the lithography machine is accelerating and shortening. If the actual focal depth does not meet the focal depth tolerance required by the lithography process, it will seriously affect the quality of the exposure line and the integrated circuit. Yield. Depth of focus has become a key factor hindering the development of light projection lithography to higher resolution. In order to make full use ...

AI Technical Summary

Problems solved by technology

The degree of freedom and constraint analysis of the mechanism shows that this leveling mechanism also has under-constrained and under-determined motion problems, and the stability of the mechanism is poor

During the leveling process, the bearing platform may rotate around the vertical direction or translate on the plane, resulting in low leveling convergence speed and reduced leveling efficiency

At the same time, this mechanism can only achieve leveling, but cannot focus. It needs to use a parallelogram flexible hinge structure for focusing, which greatly increases the vertical size of the mechanism. The structure is complex and not compact enough.

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