Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Hard x-ray micro-focus advanced multilayer laue lens

A multi-layer film, X-ray technology, applied in the research field of precision optical components, can solve the problems of low efficiency of high-order diffraction, and achieve the effect of overcoming low efficiency and improving efficiency

Inactive Publication Date: 2015-10-21
TONGJI UNIV
View PDF2 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At the same time, for the target diffraction order, by optimizing the thickness ratio of the material in the multilayer film structure and selecting an appropriate section depth, the incident energy is redistributed between different orders, which greatly improves the efficiency of high-order diffraction and overcomes the traditional The Problem of Inefficient High Order Diffraction of Zone Plates

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Hard x-ray micro-focus advanced multilayer laue lens
  • Hard x-ray micro-focus advanced multilayer laue lens
  • Hard x-ray micro-focus advanced multilayer laue lens

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0026] Such as figure 1 As shown, the high-level multilayer Laue lens focuses on the principle of diffraction, and the diffracted lights 6 and 7 of different orders are focused on different positions on the optical axis 8 . Compared with -1 order diffraction 6, when using -k order diffraction 7 to focus, the focal length is shortened by k times, and the numerical aperture is also approximately increased by k times. According to the Rayleigh criterion, the focusing resolution of the advanced multilayer Laue lens will be increased by k times. The high-level multilayer Laue lens is composed of a series of periodic and gradual partial gratings 1. According to the theory of diffraction dynamics, changing the thickness ratio γ of the absorption layer 2 and the spacer layer 3 in the local grating can make the incident energy in different diffraction orders Redistribute between times, and then select the appropriate section depth 4 for the components, so that the energy can be furthe...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to an advanced multilayered Laue lens for hard X-ray focusing. The proper depth t of the cross section can be selected by changing the thickness ratio (gamma=dA / (dA+dB), A is an absorbing layer, B is a spacing layer) of two materials of a local grating of the multilayered Laue lens, and the efficiency of the advanced diffraction can greatly enhanced, so that the advanced diffraction can be efficiently utilized, and further, the focusing resolution ratio of the hard X-ray is enhanced. Compared with the traditional multilayered Laue lens, the invention provides an effective method for realizing the high-efficiency nanoscale hard X-ray focusing, which utilizes the advanced diffraction of the Laue lens to focus the hard X-ray, and overcomes the problem of the low advanced diffraction efficiency of the traditional wave zone plate by changing the thickness ratio of the different materials in the Laue lens structure.

Description

technical field [0001] The invention belongs to the research field of precision optical components, in particular to a hard X-ray micro-focusing high-level multilayer Laue lens. Background technique [0002] Hard X-rays have high energy and large penetration depth, which can excite the inner shell electrons of high atomic number materials to identify the content and distribution of heavy elements, and can realize non-destructive depth detection of thicker samples. Therefore, hard X-ray microscopy has become a research hotspot in the three generations of synchrotron radiation laboratories in the world. Hard X-ray fluorescence, 3D tomography, and X-ray phase contrast and diffraction analysis techniques have been used in life, materials, and environmental sciences. important applications in the field. The spatial resolution of X-ray microscopy is a key technical indicator for obtaining the fine microscopic physical and chemical structures of substances and their evolution proc...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): G21K1/06
Inventor 黄秋实朱京涛李浩川王占山
Owner TONGJI UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com