Defect Scanning Method Based on Fatal Flaw Correction
A defect scanning and fatal defect technology, applied in electrical components, circuits, semiconductor/solid-state device testing/measurement, etc., can solve the problems of not being able to find chips, reducing product yield and production efficiency, and not being able to find machines in time. Achieve the effect of reducing ongoing impact, improving yield and production efficiency
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[0022] Some typical embodiments embodying the features and advantages of the present invention will be described in detail in the description in the following paragraphs. It should be understood that the invention is capable of various changes in different examples without departing from the scope of the invention, and that the descriptions and illustrations therein are illustrative in nature rather than limiting the invention.
[0023] The above and other technical features and beneficial effects will be combined with the attached figure 2 A preferred embodiment of the defect scanning method based on fatal defect correction of the present invention will be described in detail.
[0024] figure 2 It is a schematic flowchart of the defect scanning method based on fatal defect correction in the present invention. see figure 2 , the defect scanning method based on fatal defect correction of the present invention will be described in detail below, which includes the following...
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