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A treatment process and technology for silicon cores, which are applied in the field of clean processing technology of silicon cores, can solve the problems of human body and environmental hazards of silicon cores, and achieve the effects of low price, good solubility and good cleaning effect.
Active Publication Date: 2016-08-24
SICHUAN YONGXIANG NEW ENERGY CO LTD
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Problems solved by technology
[0006] In order to solve the problem of harm to the human body and the environment caused by pickling in the cleaning process of silicon cores, the present invention provides a cleaning process for silicon cores
Method used
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Embodiment 1
[0031] A clean treatment process for a silicon core, comprising the following steps:
[0032] A Vitrified diamond grinding wheel is used as the tool to grind and shape the silicon core, and pure water is used as the coolant to rinse the tool and the mouth of the silicon core when the silicon core is opened;
[0033] B After shaping, the silicon core is rinsed with pure water at the grinding place;
[0034] C After wiping the silicon core with carbon tetrachloride, put the silicon core into the ultrasonic pool for ultrasonication;
[0035] D Take out the silicon core from the ultrasonic pool and put it in an oven, and dry it at a temperature of 100°C;
[0036] E Put the dried silicon core into a vacuum oven for storage and set the temperature at 50°C.
Embodiment 2
[0038] A clean treatment process for a silicon core, comprising the following steps:
[0039] A Vitrified diamond grinding wheel is used as the tool to grind and shape the silicon core, and pure water is used as the coolant to rinse the tool and the mouth of the silicon core when the silicon core is opened;
[0040] B After shaping, the silicon core is rinsed with pure water at the grinding place;
[0041] C After wiping the silicon core with carbon tetrachloride, put the silicon core into the ultrasonic pool for ultrasonication;
[0042] D Take out the silicon core from the ultrasonic pool and put it in an oven, and dry it at a temperature of 120 °C;
[0043] E Put the dried silicon core into a vacuum oven for storage and set the temperature at 80°C.
Embodiment 3
[0045] A clean treatment process for a silicon core, comprising the following steps:
[0046] A Vitrified diamond grinding wheel is used as the tool to grind and shape the silicon core, and pure water is used as the coolant to rinse the tool and the mouth of the silicon core when the silicon core is opened;
[0047] B After shaping, the silicon core is rinsed with pure water at the grinding place for 1 min;
[0048] C After wiping the silicon core with carbon tetrachloride, put the silicon core into the ultrasonic pool for ultrasonication;
[0049] D Take out the silicon core from the ultrasonic pool and put it in an oven, and dry it at a temperature of 110 °C;
[0050] E Put the dried silicon core into a vacuum oven for storage and set the temperature at 60°C.
[0051]The wiping of the silicon core in step C refers to manually wiping with medical gauze at least four times in a clean room with gloves on until the gauze is no longer stained.
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Abstract
In order to solve the problem of harm to human body and environment caused by pickling in the cleaning process of the silicon core, the invention provides a cleaning process for the silicon core. The method includes the following steps: A. Use vitrified diamond grinding wheel as a tool to grind and shape the silicon core, and use pure water as a coolant to rinse the tool and the mouth of the silicon core when the silicon core is opened; B. Rinse the grinding place; C wipe the silicon core with carbon tetrachloride, put the silicon core in the ultrasonic pool for ultrasonic; D take out the silicon core from the ultrasonic pool and put it in an oven, and dry it at a temperature of 100‑120 °C Dry; E put the dried silicon core into a vacuum oven for storage and set the temperature at 50-80°C. This treatment method does not use pickling, which eliminates the contact between people and acid, does not need to use NOX rinsing equipment and alkaline chemicals used for rinsing, and is more environmentally friendly.
Description
technical field [0001] The invention relates to the field of polysilicon production, in particular to a silicon core cleaning process. Background technique [0002] Among the production methods of polysilicon, the polysilicon production method (also known as the Siemens method) invented by German Siemens in 1954 is currently widely used: high-purity trichlorosilane and high-purity hydrogen are mixed together according to a certain ratio to form The mixed gas of raw materials is passed into the reduction reactor, and is continuously deposited on the heated high-purity silicon core, so that the diameter of the silicon core becomes thicker gradually to form polycrystalline silicon rods. [0003] The silicon cores used in the Siemens method are mainly drawn by the silicon core furnace, and the silicon cores must be paired and then assembled and sandwiched in the reduction furnace. Mouth, root cone, etc. During the processing and shaping process, tools, cooling water, equipment...
Claims
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Application Information
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