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Makeup removal facial mask and production method thereof

A production method and facial mask technology, which are applied in the direction of cosmetic preparations, toiletry preparations, cosmetics, etc., can solve the problems of difficult to control the amount of lotion, not easy to use, and many steps of makeup removal, so as to reduce the cumbersome steps of makeup removal. Simple, low-cost effect

Inactive Publication Date: 2015-05-06
广州市洁新化妆品有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, using makeup remover to remove makeup is not easy to use, the amount of lotion is not easy to control, and it is easy to cause various wastes; moreover, there are many steps to remove makeup, which is not convenient enough

Method used

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  • Makeup removal facial mask and production method thereof
  • Makeup removal facial mask and production method thereof

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Experimental program
Comparison scheme
Effect test

Embodiment 1-5

[0032] Get the following raw materials in parts by weight respectively:

[0033] Water, Glycerin, Cetyl Palmitate, PEG-7 Olive Oil Esters, Glyceryl Cocoate, Isohexadecane, Dimethicone, Polysorbate-80, Polysorbate-20 , Cetearyl Isononanoate, Ceteareth-20, Cetearyl Alcohol, Glyceryl Stearate, Ceteareth-12, Phenoxyethanol, Paraben Esters, Sodium Acrylate / Sodium Acryloyldimethyltaurate Copolymer, Purslane Extract, Fragrance.

[0034] See Table 1 for specific ratios.

[0035] Table 1 The proportioning table of Embodiment 1-5

[0036]

[0037]

[0038] The preparation method of described cleansing facial mask, its concrete steps are as follows:

[0039] 1) Add the solvent, humectant, and emollient into the emulsification pot according to the formula ratio, and perform high-speed homogeneous stirring to make them disperse and dissolve evenly. The stirring speed is 16r / min, and the temperature is above 80°C for 3-8 minutes.

[0040] 2) After the treatment in step 1), add a t...

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Abstract

The invention discloses a makeup removal facial mask and a production method thereof. According to the production method, water is used as a solvent, glycerin, cetyl palmitate, PEG-7 olive oil ester, glyceryl cocoate, isohexadecane, polydimethylsiloxane, polysorbate-80 and polysorbate-20 are used as emulsifiers, cetearyl isononanoate, ceteareth-20, cetostearyl alcohol, glyceryl stearate and ceteareth-12 are used as emollients, phenoxyethanol and methylparaben are used as preservatives, sodium acrylate / sodium acryloyldimethyl taurate copolymer are used as a thickener; a purslane extract is used as a skin conditioner and essences are added, thus obtain the makeup removal facial mask. The production method disclosed by the invention is capable of reducing makeup removal steps, improving a makeup removal effect, and enhancing the usability of a makeup removal liquid; a makeup remover with nutrition to a certain extent is capable of still keeping the skin moist after makeup removal, more convenient to use, and better in effect.

Description

technical field [0001] The invention relates to a facial mask, in particular to a makeup-removing facial mask and a manufacturing method thereof. Background technique [0002] With the improvement of living standards, more and more people will get used to makeup, but after facial makeup, if it is not removed thoroughly, the residual cosmetics will cause the pores of the facial skin to be blocked, resulting in imbalance of oil, water and oil secretion in the skin, resulting in acne, Troubling skin problems like acne and blackheads. At the same time, the residue of cosmetics is very harmful to the skin. If it cannot be cleaned in time, it will enter the hair follicle with the breathing of the pores and form a cyst. The makeup remover link is very important. In the prior art, most of them use lotion to remove makeup. For example, the invention patent with the patent application number CN201410114416.6 discloses a mild and harmless makeup remover. The makeup remover is compose...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): A61K8/97A61Q1/14A61Q19/00
Inventor 周金平
Owner 广州市洁新化妆品有限公司
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